发明公开
- 专利标题: Piezoelectric thin film component and method of manufacturing thereof
- 专利标题(中): 的压电薄膜元件和制造工艺
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申请号: EP99101333.5申请日: 1999-01-25
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公开(公告)号: EP0932209A3公开(公告)日: 2004-12-01
- 发明人: Sumi, Kouji , Hong, Qiu
- 申请人: SEIKO EPSON CORPORATION
- 申请人地址: 4-1, Nishi-shinjuku 2-chome Shinjuku-ku, Tokyo 163-0811 JP
- 专利权人: SEIKO EPSON CORPORATION
- 当前专利权人: SEIKO EPSON CORPORATION
- 当前专利权人地址: 4-1, Nishi-shinjuku 2-chome Shinjuku-ku, Tokyo 163-0811 JP
- 代理机构: Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
- 优先权: JP1140598 19980123
- 主分类号: H01L41/22
- IPC分类号: H01L41/22 ; B41J2/14
摘要:
Providing a mechanism which can eliminate an influence of residual strain in a piezoelectric thin film, having excellent piezoelectric strain characteristics. A thin film piezoelectric component is provided having low residual strain at its grain boundary (14A) between the piezoelectric PZT film (15) and its platinum electrode (14), even after performing polarization processing (poling) on the piezoelectric thin film component. The width of the grain boundary is 5 nm or less. The crystal grain boundary is a discontinuous layer which does not continue the orientation of adjacent crystal grains.
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