发明公开
- 专利标题: METHOD FOR FORMING FILM BY PLASMA POLYMERIZATION AND APPARATUS FOR FORMING FILM BY PLASMA POLYMERIZATION
- 专利标题(中): 一种通过等离子体形成的等离子和设备的胶片拍摄
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申请号: EP97950416申请日: 1997-12-26
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公开(公告)号: EP0935011A4公开(公告)日: 2003-07-02
- 发明人: TAKAI MITSURU , MIYAZAKI SHINJI , UEDA KUNIHIRO , KANAZAWA HIROMICHI
- 申请人: TDK CORP
- 专利权人: TDK CORP
- 当前专利权人: TDK CORP
- 优先权: JP35760996 1996-12-27
- 主分类号: B05D7/24
- IPC分类号: B05D7/24 ; C08F2/46 ; C23C14/12 ; C23C14/56
摘要:
An electrode coated with a polymeric material at a percentage of covering of 50 to 100 % is used as the electrode facing that side of a continuous substrate on which a film is to be formed by plasma polymerization. Plasma polymerization is conducted under the conditions of an operating pressure of 10-3 to 1 Torr to form a film on the substrate. Consequently, the method produces an excellent effect of remarkably suppressing abnormal discharge during the film formation by plasma polymerization, thus making it possible to stably form a film by plasma polymerization over long and thus improve the yield of the product. The film formed by the plasma polymerization has extremely good properties.
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