专利检索 ap:("TDK CORP") AND inv:"UEDA KUNIHIRO" 第 1 页

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发明公开
METHOD FOR FORMING FILM BY PLASMA POLYMERIZATION AND APPARATUS FOR FORMING FILM BY PLASMA POLYMERIZATION 失效
标题翻译：一种通过等离子体形成的等离子和设备的胶片拍摄

公开(公告)号：EP0935011A4

公开(公告)日：2003-07-02

申请号：EP97950416

申请日：1997-12-26

申请人： TDK CORP

发明人： TAKAI MITSURU , MIYAZAKI SHINJI , UEDA KUNIHIRO , KANAZAWA HIROMICHI

IPC分类号： B05D7/24 , C08F2/46 , C23C14/12 , C23C14/56

CPC分类号： B05D1/62 , C23C14/12 , C23C14/562

摘要： An electrode coated with a polymeric material at a percentage of covering of 50 to 100 % is used as the electrode facing that side of a continuous substrate on which a film is to be formed by plasma polymerization. Plasma polymerization is conducted under the conditions of an operating pressure of 10-3 to 1 Torr to form a film on the substrate. Consequently, the method produces an excellent effect of remarkably suppressing abnormal discharge during the film formation by plasma polymerization, thus making it possible to stably form a film by plasma polymerization over long and thus improve the yield of the product. The film formed by the plasma polymerization has extremely good properties.