发明公开
- 专利标题: Diffraction condition simulation device, diffraction measurement system, and crystal analysis system
- 专利标题(中): 衍射条件模拟装置,衍射测量系统和晶体分析系统
-
申请号: EP99303849.6申请日: 1999-05-18
-
公开(公告)号: EP0959345A3公开(公告)日: 2001-10-17
- 发明人: Yokoyama, Ryouichi , Endo, Kamihisa , Ozawa, Tetsuya , Harada, Jimpei
- 申请人: Rigaku Corporation
- 申请人地址: 3-9-12, Matsubara-cho Akishima-shi, Tokyo 196 JP
- 专利权人: Rigaku Corporation
- 当前专利权人: Rigaku Corporation
- 当前专利权人地址: 3-9-12, Matsubara-cho Akishima-shi, Tokyo 196 JP
- 代理机构: Jackson, Robert Patrick
- 优先权: JP13529798 19980518; JP13190699 19990512
- 主分类号: G01N23/20
- IPC分类号: G01N23/20 ; G06F17/00
摘要:
A novel diffraction condition simulation device for calculating a reciprocal lattice to a crystal sample and displaying, on a computer screen, a Bragg reflection condition of X rays caused by the crystal sample, characterized in that a section where a plurality of reciprocal lattice points in a limiting sphere which rotates with rotation of a crystal intersect a diffraction plane is displayed with a section of the limiting sphere on the computer screen, is provided, thereby realizing quick and easy calculation and display of a desired Bragg reflection satisfying various diffraction conditions necessary for structure analysis and characterization of structure of a crystal, without any limitation as to diffraction conditions, diffraction information and the like.
公开/授权文献
信息查询