发明公开
EP0969457A2 Sputtering target, method of producing the target and method of fabricating an optical recording medium
失效
溅射靶,产生溅射靶及其制造方法的光学记录介质的方法
- 专利标题: Sputtering target, method of producing the target and method of fabricating an optical recording medium
- 专利标题(中): 溅射靶,产生溅射靶及其制造方法的光学记录介质的方法
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申请号: EP99120157.5申请日: 1995-12-13
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公开(公告)号: EP0969457A2公开(公告)日: 2000-01-05
- 发明人: Yamada, Katsuyuki , Iwasaki, Hiroko , Ide, Yukio , Harigaya, Makoto , Kageyama, Yoshiyuki , Deguchi, Hiroshi , Takahashi, Masaetsu , Hayashi, Yoshitaka
- 申请人: Ricoh Company, Ltd.
- 申请人地址: 3-6, Nakamagome 1-chome, Ohta-ku Tokyo 143-8555 JP
- 专利权人: Ricoh Company, Ltd.
- 当前专利权人: Ricoh Company, Ltd.
- 当前专利权人地址: 3-6, Nakamagome 1-chome, Ohta-ku Tokyo 143-8555 JP
- 代理机构: Barz, Peter, Dr.
- 优先权: JP33253294 19941213
- 主分类号: G11B7/26
- IPC分类号: G11B7/26 ; G11B7/24 ; C23C14/34
摘要:
A sputtering target for fabricating a recording layer of a phase-change type optical recording medium contains a compound or mixture including as constituent elements Ag, In, Te and Sb with the respective atomic percent (atom.%) of α, β, γ and δ thereof being in the relationship of 2 ≤ α ≤ 30, 3 ≤ β ≤ 30, 10 ≤ γ ≤ 50, 15 ≤ δ ≤ 83 and α + β + γ + δ = 100 , and a method of producing the above sputtering target is provided. A method of fabricating a phase-change type optical recording medium is also provided.
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