发明公开
EP0969457A2 Sputtering target, method of producing the target and method of fabricating an optical recording medium 失效
溅射靶,产生溅射靶及其制造方法的光学记录介质的方法

Sputtering target, method of producing the target and method of fabricating an optical recording medium
摘要:
A sputtering target for fabricating a recording layer of a phase-change type optical recording medium contains a compound or mixture including as constituent elements Ag, In, Te and Sb with the respective atomic percent (atom.%) of α, β, γ and δ thereof being in the relationship of 2 ≤ α ≤ 30, 3 ≤ β ≤ 30, 10 ≤ γ ≤ 50, 15 ≤ δ ≤ 83 and α + β + γ + δ = 100 , and a method of producing the above sputtering target is provided. A method of fabricating a phase-change type optical recording medium is also provided.
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