发明公开
- 专利标题： Polyvinyl acetals having imido groups and use thereof in photosensitive compositions
- 专利标题（中）： 聚乙烯醋酸乙烯酯和醋酸纤维素
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申请号： EP99120000.7申请日： 1999-10-14
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公开(公告)号： EP0996037A2公开(公告)日： 2000-04-26
- 发明人: Baumann, Harald , Savariar-Hauck, Celin , Timpe, Hans-Joachim
- 申请人： Kodak Polychrome Graphics GmbH
- 申请人地址： An der Bahn 80 37520 Osterode/Harz DE
- 专利权人： Kodak Polychrome Graphics GmbH
- 当前专利权人： Kodak Polychrome Graphics GmbH
- 当前专利权人地址： An der Bahn 80 37520 Osterode/Harz DE
- 代理机构： VOSSIUS & PARTNER
- 优先权： DE19847616 19981015
- 主分类号： G03F7/033
- IPC分类号： G03F7/033 ; C08L29/14
摘要：
This invention relates to polyvinyl acetals containing the units A, B, C and D, wherein A is present in an amount of 0.5 to 20 wt.-% and is of the formula
B is present in an amount of 15 to 35 wt.-% and is of the formula
C is present in an amount of 10 to 50 wt.-% and is of the formula
wherein R 1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group, to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halos, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group X-NR 6 -CO-Y-COOH, wherein X is an aliphatic, aromatic or araliphatic spacer group, R 6 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and this unit C may be contained several times with various moieties R 1 independent of one another, and D is present in an amount of 25 to 70 wt.-% and is of the formula
wherein
n is an integer from 1 to 3 and
R 2 and R 3 are a hydrogen or a methyl group, and
R 4 and R 5 independent of one another are alkyl groups having no more than 4 carbons or R 4 and R 5 , together with the two carbons they are attached to, represent a 5- or 6-membered carbocyclic ring.
In addition, photosensitive compositions containing these polyvinyl acetals are described.
B is present in an amount of 15 to 35 wt.-% and is of the formula
C is present in an amount of 10 to 50 wt.-% and is of the formula
wherein R 1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group, to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halos, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group X-NR 6 -CO-Y-COOH, wherein X is an aliphatic, aromatic or araliphatic spacer group, R 6 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and this unit C may be contained several times with various moieties R 1 independent of one another, and D is present in an amount of 25 to 70 wt.-% and is of the formula
wherein
n is an integer from 1 to 3 and
R 2 and R 3 are a hydrogen or a methyl group, and
R 4 and R 5 independent of one another are alkyl groups having no more than 4 carbons or R 4 and R 5 , together with the two carbons they are attached to, represent a 5- or 6-membered carbocyclic ring.
In addition, photosensitive compositions containing these polyvinyl acetals are described.
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