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公开(公告)号：EP1922589A2
公开(公告)日：2008-05-21
申请号：EP06808815.2
申请日：2006-08-18
CPC分类号： G03F7/322 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： The invention relates to a method for making a lithographic printing plate which comprises imagewise exposing a lithographic printing plate precursor comprising one or more layers at least one of which is associated with one or more unsubstituted or substituted triarylmethane dyes and at least one of which layers is radiation-sensitive, and developing the imagewise exposed printing plate precursor with an aqueous alkaline developing composition, wherein the composition comprises at least one amphoteric surfactant of formula (I): - wherein R1 is an unsubstituted alkyl group; each R2 and each R3 are independently selected from H, hydroxy and an unsubstituted or substituted alkyl group; R4 and R5 are independently selected from an unsubstituted alkyl group or one Of R4 and R5 may be the group -(CH2)m-Y-R1; X- is selected from COO-, SO3-, OSO3-, PO3H-, PO3Z-, OPO3H- and OPO3Z-, wherein Z is a monovalent cation; Y is selected from CONH, NHCO, COO, OCO, NHCONH and O; 1 is 0 or 1; m is an integer from 1 to 10; and n is an integer from 1 to 5, The use of the composition for the development of radiation- sensitive positive- or negative- printing plate precursors depresses sludge formation associated with the presence of the triarylmethane dyes, thereby increasing developing capacity, and also prevents coloration of components in the developing section of the processor caused by the presence of such dyes.
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公开(公告)号：EP1255648B1
公开(公告)日：2007-12-05
申请号：EP01916722.0
申请日：2001-02-01
发明人： MOULIN, Michel
CPC分类号： G02B6/3636 , B41J2/465 , B41J2/475 , G02B6/3624 , G02B6/3652 , G02B6/368 , G02B6/4203 , G02B6/4249 , G02B6/4296
摘要： An optical illumination system for directing the radiant energy produced by an array of high-power laser fibers to a spatial modulator from which selected rays are directed to a media requiring radiation of high radiant intensity includes various lenses and an optical mixer to transfer the high energy beams of the laser emitters to the modulator. More particularly, the illumination system comprises: (a) a plurality of laser radiation sources; (b) means for transmitting rays such as a plurality of optical fibers from the laser sources to means for collimating the rays such as a collimating lens; (c) means for imaging the collimated rays such as a plurality of imaging lenses; (d) means for collimating the imaged rays such as a collimating lens; (e) means for modulating the imaged and collimated rays such as a total internal reflection modulator, wherein focalizing means such as a focalizing lens focalize the imaged and collimated rays on the modulating means; (f) lens means which receive rays from the modulating means; (g) means for separating the diffraction orders of the rays received from the lens means such as a plate having a slit; and (h) imaging means such as a telecentric objective lens for receiving rays from the separating means and forming a reduced image of the modulator.
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公开(公告)号：EP1794657A1
公开(公告)日：2007-06-13
申请号：EP05785267.5
申请日：2005-08-25
CPC分类号： B41C1/10 , B41C1/1008 , B41C1/1016 , B41C1/1058 , B41C1/1066 , B41C1/1091 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41N3/08 , G03F7/405
摘要： A process for the post-treatment of an imaged lithographic printing plate comprises (a) Contacting a lithographic printing plate having image areas and non-image areas on a lithographic substrate with a solution comprising at least one phosphono-substituted siloxane of the following general formula (I) that is defined herein and (b) drying.
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公开(公告)号：EP1791699A1
公开(公告)日：2007-06-06
申请号：EP05784586.9
申请日：2005-08-25
IPC分类号： B41N3/03 , C09D183/08
CPC分类号： B41N3/038 , B41C1/1008 , B41C1/1058 , B41C1/1066 , B41C1/1091 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , C09D183/08
摘要： Lithographic substrate comprising (a) a dimensionally stable plate- or foil-shaped support, (b) an aluminum oxide layer provided on at least one side of the support (a), and (c) a hydrophilic layer applied onto the aluminum oxide layer comprising at least one phosphono-substituted siloxane of the general formula (I)
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5.发明公开
公开(公告)号：EP1690138A1
公开(公告)日：2006-08-16
申请号：EP04803184.3
申请日：2004-11-18
发明人： BAUMANN, Harald , DWARS, Udo , FLUGEL, Michael
IPC分类号： G03F7/031
CPC分类号： G03F7/031 , Y10T428/31591
摘要： Radiation-sensitive composition comprising (a) at least one photopolymerizable compound with at least one ethylenically unsaturated group accessible to a free-radical polymerization, wherein the at least one photopolymerizable compound has a molecular weight of 3,000 or less and can be obtained by reacting a diisocyanate with (I) an ethylenically unsaturated compound with a hydroxy group, and at the same time (ii) a saturated organic compound with an NH group and an OH group, wherein the reactants are used in amounts according to the following condition: Number of moles of isocyanate groups ≤ number of moles of OH plus NH groups; (b) at least one sensitizer which absorbs radiation from the wavelength range of 250 to 450 nm of the electromagnetic spectrum and is selected from: dihydropyridines of formula (I) and oxazole derivatives of formula (II): (II) (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from 2,2’, 4,4’, 5’5-hexaarylbiimidazoles, compounds with at least one photolytically cleavable trihalogenmethyl group, diaryliodonium salts, triarylsulfonium salts and N-heterocyclic compounds with at least one nitrogen atom in the ring, having an oxy substituent at least one ring nitrogen atom, and mixtures of the above compounds; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors; with the proviso that the radiation-sensitive composition does not comprise a metallocene.
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公开(公告)号：EP1654118A1
公开(公告)日：2006-05-10
申请号：EP04763933.1
申请日：2004-08-09
发明人： HAUCK, Gerhard , FRANK, Dietmar
IPC分类号： B41C1/10
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/106 , Y10S430/165
摘要： Heat-sensitive element comprising a) an optionally pretreated substrate; b) a positive working coating comprising (i) at least 40 wt.-%, based on the dry weight of the coating, of at least one polymer soluble in aqueous alkaline developer selected from novolak resins, functionalized novolak resins, polyvinylphenol resins, polyvinyl cresols and poly(meth)acrylates with phenolic and/or sulfonamide side groups, (ii) 01-20 wt.-%, based on the dry weight of the coating, of at least one (C4-C20 alkyl)phenol novolak resin insoluble in aqueous alkaline developer, and (iii) optionally at least one further component selected from polymer particles, surfactants, contrast dyes and pigments, inorganic fillers, antioxidants, print-out dyes, carboxylic acid derivatives of cellulose polymers, plasticizers and substances capable of absorbing radiation of a wavelength from the range of 650 to 1,300 nm and converting it into heat.
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7.发明公开Radiation-sensitive, positive working coating composition based on carboxylic copolymers 审中-公开基于羧基官能化共聚物的放射线敏感性，正性工作组合物涂层
公开(公告)号：EP1276010A3
公开(公告)日：2003-03-26
申请号：EP02015549.5
申请日：2002-07-11
发明人： Hauck, Gerhard , Jarek, Mathias
IPC分类号： G03F7/023
CPC分类号： G03F7/0233
摘要： A radiation-sensitive composition, positive-working coating compositions useful for the preparation of lithographic printing plates and lithographic printing plate precursors comprising the composition are disclosed. The composition comprises at least one quinonediazide compound and at least one carboxylic copolymer. The compositions produce lithographic printing plates that show high print run stability.
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8.发明公开
公开(公告)号：EP0996037A2
公开(公告)日：2000-04-26
申请号：EP99120000.7
申请日：1999-10-14
CPC分类号： G03F7/0388 , C08F8/00 , Y10S430/11 , Y10S430/127 , C08F16/06
摘要： This invention relates to polyvinyl acetals containing the units A, B, C and D, wherein A is present in an amount of 0.5 to 20 wt.-% and is of the formula
B is present in an amount of 15 to 35 wt.-% and is of the formula
C is present in an amount of 10 to 50 wt.-% and is of the formula
wherein R 1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group, to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halos, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group X-NR 6 -CO-Y-COOH, wherein X is an aliphatic, aromatic or araliphatic spacer group, R 6 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and this unit C may be contained several times with various moieties R 1 independent of one another, and D is present in an amount of 25 to 70 wt.-% and is of the formula
wherein
n is an integer from 1 to 3 and
R 2 and R 3 are a hydrogen or a methyl group, and
R 4 and R 5 independent of one another are alkyl groups having no more than 4 carbons or R 4 and R 5 , together with the two carbons they are attached to, represent a 5- or 6-membered carbocyclic ring.
In addition, photosensitive compositions containing these polyvinyl acetals are described.摘要翻译： 本发明涉及含有单元A，B，C和D的聚乙烯醇缩醛，其中A以0.5至20重量％的量存在并且具有式CHEM B的量为15至35 重量％，并且具有式CHEM C的存在量为10至50重量％，并且具有式CHEM>其中R 1是具有至多4个碳的烷基，其中 任选被酸基连接的酸基或苯基取代，其中苯基任选地包含1至2个另外的选自卤素，氨基，甲氧基，乙氧基，甲基和乙基的取代基，或者是 基团X-NR 6 -CO-Y-COOH，其中X是脂族，芳族或芳脂族间隔基，R 6是氢或脂族，芳族或芳脂族部分，Y是饱和或不饱和的链或 环状间隔基团，并且该单元C可以彼此独立地存在各种部分R 1多次，D以25至70重量％的量存在，i 其中n是1至3的整数，R 2和R 3是氢或甲基，R 4和R 5彼此独立地是烷基 具有不超过4个碳原子的基团或R 4和R 5与它们所连接的两个碳一起代表5-或6-元碳环。 此外，描述了含有这些聚乙烯醇缩醛的光敏组合物。
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公开(公告)号：EP1791700A1
公开(公告)日：2007-06-06
申请号：EP05786617.0
申请日：2005-08-23
IPC分类号： B41N3/08
CPC分类号： B41N3/08
摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs
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公开(公告)号：EP1774404A2
公开(公告)日：2007-04-18
申请号：EP05774698.4
申请日：2005-07-14
IPC分类号： G03F7/00
CPC分类号： G03F7/0757 , G03F7/028
摘要： Radiation-sensitive element comprising (a) an optionally pretreated substrate and (b) a radiation-sensitive coating consisting of a composition comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one radiation-sensitive initiator or initiator system for free-radical polymerization absorbing radiation selected from the wavelength range of 300 to 1,200 nm; and (iii) at least one silsesquioxane comprising at least one substituent with at least one ethylenically unsaturated group each; applied onto the substrate.
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