发明公开
- 专利标题： ORGANOSILICON NANOCLUSTER AND PROCESS FOR PRODUCING THE SAME
- 专利标题（中）： 有机硅纳米团簇及其制备方法
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申请号： EP98911047申请日： 1998-03-27
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公开(公告)号： EP1000949A4公开(公告)日： 2001-10-31
- 发明人: MIWA TAKAO , WATANABE AKIRA-KAWAUCHI JUTAKU , ITOU OSAMU , SUZUKI MASAO
- 申请人： HITACHI LTD
- 专利权人： HITACHI LTD
- 当前专利权人： HITACHI LTD
- 优先权： JP16371897 1997-06-20; JP29818797 1997-10-30
- 主分类号： G02B6/12
- IPC分类号： G02B6/12 ; H01L21/20 ; H01L21/312 ; H01L21/316 ; H01L51/30 ; C07F7/08 ; H01L21/208
摘要：
A composition of an organosilicon nanocluster and a method for manufacturing thereof are disclosed. Further; details of a thin-film of silicon and a thin-film of silicon oxide both produced from said organosilicon nanocluster, and an electronic device comprising the organosilicon nanocluster are also disclosed. The organosilicon nanocluster is soluble in an organic solvent and a band gap of a solution thereof in the organic solvent is between 3 eV and 1.2 eV when determined with a Tauc plotting method.
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