发明公开
- 专利标题： Piezoelectric thin-film device, process for manufacturing the same, and ink-jet recording head using the same
- 专利标题（中）： 维尔法赫恩·赫斯特伦
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申请号： EP00103235.8申请日： 1997-03-05
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公开(公告)号： EP1018771A1公开(公告)日： 2000-07-12
- 发明人: Nishiwaki, Tsutomu , Sumi, Kouji , Murai, Masami , Shimada, Masato
- 申请人： SEIKO EPSON CORPORATION
- 申请人地址： 4-1, Nishishinjuku 2-chome Shinjuku-ku Tokyo JP
- 专利权人： SEIKO EPSON CORPORATION
- 当前专利权人： SEIKO EPSON CORPORATION
- 当前专利权人地址： 4-1, Nishishinjuku 2-chome Shinjuku-ku Tokyo JP
- 代理机构： Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
- 优先权： JP4902696 19960306; JP7766896 19960329
- 主分类号： H01L41/24
- IPC分类号： H01L41/24
摘要：
A piezoelectric thin-film device, a process for its manufacturing, and an ink-jet recording head comprising said thin-film device are provided, wherein the PZT seed crystals are produced by either physical vapor deposition, chemical vapor disposition, or spin-coating.
公开/授权文献
- EP1018771B1 Process for manufacturing a piezoelectric thin-film device 公开/授权日：2005-12-28
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