发明公开
- 专利标题： Thermal reaction chamber for semiconductor wafer processing operations
- 专利标题（中）： 用于处理半导体晶片的热反应室
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申请号： EP00121439.4申请日： 1994-02-28
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公开(公告)号： EP1067588A3公开(公告)日： 2006-05-31
- 发明人: Perlov, Ilya
- 申请人： APPLIED MATERIALS, INC.
- 申请人地址： 3050 Bowers Avenue, P.O. Box 450A Santa Clara, California 95054 US
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： 3050 Bowers Avenue, P.O. Box 450A Santa Clara, California 95054 US
- 代理机构： Zimmermann, Gerd Heinrich
- 优先权： US23844 19930226
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A thermal reaction chamber (30) for semiconductor wafer processing operations comprising:
(i) a susceptor (36) for supporting a semiconductor wafer (38) within the chamber (32) and having a plurality of apertures (70) formed vertically therethrough;
(ii) displacer means (35) for displacing the susceptor (36) vertically between at least a first and a second position;
(iii) a plurality of wafer support elements (66), each of which is suspended to be vertically moveable within said apertures (70) and each of which extends beyond the underside of the susceptor (36); and
(iv) means (64) for restricting the downward movement of the wafer support elements (66). As the susceptor is displaced from its first position through an intermediate position before the second position, the means (64) for restricting operate to stop the continued downward movement of the wafer support elements (66) thereby causing the elements to move vertically upwards with respect to the downwardly moving susceptor (36) and separate the wafer (38) from the susceptor (36).
(v) the plurality of wafer support elements (66) comprising heads to shut off all said apertures through the susceptor.
(i) a susceptor (36) for supporting a semiconductor wafer (38) within the chamber (32) and having a plurality of apertures (70) formed vertically therethrough;
(ii) displacer means (35) for displacing the susceptor (36) vertically between at least a first and a second position;
(iii) a plurality of wafer support elements (66), each of which is suspended to be vertically moveable within said apertures (70) and each of which extends beyond the underside of the susceptor (36); and
(iv) means (64) for restricting the downward movement of the wafer support elements (66). As the susceptor is displaced from its first position through an intermediate position before the second position, the means (64) for restricting operate to stop the continued downward movement of the wafer support elements (66) thereby causing the elements to move vertically upwards with respect to the downwardly moving susceptor (36) and separate the wafer (38) from the susceptor (36).
(v) the plurality of wafer support elements (66) comprising heads to shut off all said apertures through the susceptor.
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