发明公开
EP1075028A2 Photoelectric conversion device and process for its fabrication
有权
Photoelektrische Umwandlungsvorrichtung und deren Herstellungsverfahren
- 专利标题: Photoelectric conversion device and process for its fabrication
- 专利标题(中): Photoelektrische Umwandlungsvorrichtung und deren Herstellungsverfahren
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申请号: EP00306637.0申请日: 2000-08-04
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公开(公告)号: EP1075028A2公开(公告)日: 2001-02-07
- 发明人: Yuzurihara, Hiroshi, c/o Canon Kabushiki Kaisha
- 申请人: CANON KABUSHIKI KAISHA
- 申请人地址: 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo JP
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo JP
- 代理机构: Beresford, Keith Denis Lewis
- 优先权: JP22307899 19990805; JP2000232108 20000731
- 主分类号: H01L27/146
- IPC分类号: H01L27/146
摘要:
In a photoelectric conversion device comprising a photoelectric-conversion section and a peripheral circuit section where signals sent from the photoelectric-conversion section are processed, the both sections being provided on the same semiconductor substrate, a semiconductor compound layer of a high-melting point metal is provided on the source and drain and a gate electrode of an MOS transistor that forms the peripheral circuit section, and the top surface of a semiconductor diffusion layer that serves as a light-receiving part of the photoelectric conversion section is in contact with an insulating layer.
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