A transparent conductive laminate in which a crystalline transparent conductive film substantially made of In-Sn-O is formed on the transparent substrate composed of a thermoplastic polymer film. The crystalline part of the transparent conductive film (ITO film) is a transparent conductive laminate having a special crystal structure in which the strength of X-rays diffracted by the (222) crystal plane or the (440) crystal plane is the highest and the ratio [X440/222] of the strength of X-rays diffracted by the (440) crystal plane to that by the (222) crystal plane is within a range of 0.2 to 2.5. The transparent conductive laminate is low in surface resistivity and useful as an electrode material such as of a liquid crystal display, an electroluminescence device, or a touch panel. The transparent conductive laminate is manufactured by a combination of control of the film-forming atmosphere in sputtering and heat treatment under specific conditions after the film is formed.