发明公开
EP1083460A1 Method and apparatus for exposing a photosensitive material
有权
Verfahren und Apparat zum Belichten von lichtempfindlichem材料
- 专利标题： Method and apparatus for exposing a photosensitive material
- 专利标题（中）： Verfahren und Apparat zum Belichten von lichtempfindlichem材料
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申请号： EP99202942.1申请日： 1999-09-09
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公开(公告)号： EP1083460A1公开(公告)日： 2001-03-14
- 发明人: Palmius, Kjell , Hummelink, Janniek
- 申请人： Fuji Photo Film B.V.
- 申请人地址： Oudenstaart 1 5047 TK Tilburg NL
- 专利权人： Fuji Photo Film B.V.
- 当前专利权人： Fuji Photo Film B.V.
- 当前专利权人地址： Oudenstaart 1 5047 TK Tilburg NL
- 代理机构： Ottevangers, Sietse Ulbe
- 主分类号： G03C5/02
- IPC分类号： G03C5/02 ; G03C7/18
摘要：
The invention relates to a method and apparatus for exposing a photosensitive material such as colour negative film, colour reversal film and colour photographic paper, for evaluating the photographic characteristics of said photosensitive material. At least two different areas of the material are exposed differently and at least one light beam is used. At least one light beam is split into at least first and second parts which are equal to each other. At least two different areas are respectively exposed to the first part of the said light beam and the second part of the said light beam.
公开/授权文献
- EP1083460B1 Method and apparatus for exposing a photosensitive material 公开/授权日：2006-03-01
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