发明公开
- 专利标题： Lithographic apparatus with mask clamping apparatus
- 专利标题（中）： 用掩模夹光刻设备
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申请号： EP00310188.8申请日： 2000-11-16
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公开(公告)号： EP1107066A3公开(公告)日： 2004-12-15
- 发明人: Donders, Sjoerd Nicolaas Lambertus , Van Empel, Tjarko Adriaan Rudolf
- 申请人： ASML Netherlands B.V.
- 申请人地址： De Run 6501 5504 DR Veldhoven NL
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： De Run 6501 5504 DR Veldhoven NL
- 代理机构： Leeming, John Gerard
- 优先权： EP99204103 19991203
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
An arrangement for supporting a mask 10 comprises a pair of members 14. The mask 10 is held against each member 14 by a vacuum arrangement which prevents relative motion between the mask and members. The members 14 are compliant such that they accommodate flatness variations in the mask 10 but without deforming the mask 10.
公开/授权文献
- EP1107066B1 Lithographic apparatus with mask clamping apparatus 公开/授权日：2007-10-24
信息查询
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