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公开(公告)号：EP1107066A3
公开(公告)日：2004-12-15
申请号：EP00310188.8
申请日：2000-11-16
IPC分类号： G03F7/20
CPC分类号： G03F7/707
摘要： An arrangement for supporting a mask 10 comprises a pair of members 14. The mask 10 is held against each member 14 by a vacuum arrangement which prevents relative motion between the mask and members. The members 14 are compliant such that they accommodate flatness variations in the mask 10 but without deforming the mask 10.
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公开(公告)号：EP1447716A3
公开(公告)日：2005-01-05
申请号：EP04075434.3
申请日：2004-02-11
发明人： De Bokx, Pieter Klaas , Van Empel, Tjarko Adriaan Rudolf , Hultermans, Ronald Johannes , Jonkers, Adrianus Cornelius Antonius
IPC分类号： G03F7/20
CPC分类号： G03F7/70933
摘要： The invention is related to a lithographic projection apparatus comprising a gas flushing system (200) wherein this gas flushing system (200) and a substrate (W) define an intermediate space for a radial gas flow (203) between the gas flushing system (200) and the substrate (W), and wherein the gas flushing system (200) also comprises extra outlets (202) for generating the radial gas flow (203), and wherein the gas flushing system (200), in use, is arranged to generate this radial gas flow (203) such that the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.
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公开(公告)号：EP1447716A2
公开(公告)日：2004-08-18
申请号：EP04075434.3
申请日：2004-02-11
发明人： De Bokx, Pieter Klaas , Van Empel, Tjarko Adriaan Rudolf , Hultermans, Ronald Johannes , Jonkers, Adrianus Cornelius Antonius
IPC分类号： G03F7/20
CPC分类号： G03F7/70933
摘要： The invention is related to a lithographic projection apparatus comprising a gas flushing system (200) wherein this gas flushing system (200) and a substrate (W) define an intermediate space for a radial gas flow (203) between the gas flushing system (200) and the substrate (W), and wherein the gas flushing system (200) also comprises extra outlets (202) for generating the radial gas flow (203), and wherein the gas flushing system (200), in use, is arranged to generate this radial gas flow (203) such that the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.
摘要翻译： 本发明涉及一种包括气体冲洗系统（200）的平版印刷投影设备，其中该气体冲洗系统（200）和基底（W）在气体冲洗系统（200）之间限定径向气体流（203）的中间空间 ）和衬底（W），并且其中所述气体冲洗系统（200）还包括用于产生径向气体流（203）的额外出口（202），并且其中在使用中的气体冲洗系统（200）布置成 产生这种径向气流（203），使得径向气流具有在所述空间中向外指向的径向速度，其中所述空间中的每个位置具有大于零的幅度。
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公开(公告)号：EP1059566A3
公开(公告)日：2002-09-18
申请号：EP00304667.9
申请日：2000-06-01
IPC分类号： G03F7/20
CPC分类号： G03F7/707
摘要： A lithographic projection apparatus comprising: a radiation system (LA,EX,IN,CO) for supplying a projection beam (PB) of radiation; a mask table (MT) provided with a mask holder for holding a mask (MA); a substrate table (WT) provided with a substrate holder for holding a substrate (W); a projection system (PL) for imaging an irradiated portion of the mask onto a target portion (C) of the substrate, the substrate holder having a supporting face (S:4,6,6',8) for supporting a substrate, the said supporting face being at least partially coated with a layer of electrically conductive material.
摘要翻译： 一种光刻投影设备，包括：用于提供辐射的投影光束（PB）的辐射系统（LA，EX，IN，CO） 具有用于保持掩模（MA）的掩模架的掩模台（MT）; 衬底台（WT），设置有用于保持衬底（W）的衬底保持器; 用于将掩模的照射部分成像到衬底的目标部分（C）上的投影系统（PL），所述衬底支架具有用于支撑衬底的支撑面（S：4,6,6'，8），所述 所述支撑面至少部分地涂覆有导电材料层。
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公开(公告)号：EP1482370B1
公开(公告)日：2012-02-01
申请号：EP04076312.0
申请日：2004-04-29
IPC分类号： G03F7/20
CPC分类号： G03F7/707 , G03F7/70783
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公开(公告)号：EP1256847B1
公开(公告)日：2007-07-25
申请号：EP02253174.3
申请日：2002-05-07
发明人： Schrijver, Raymond Laurentius Johannes , Van Empel, Tjarko Adriaan Rudolf , Baggen, Marcel Koenraad Marie
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70866 , G03F7/70933
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公开(公告)号：EP1498780A3
公开(公告)日：2005-04-06
申请号：EP04077030.7
申请日：2004-07-13
IPC分类号： G03F7/20
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic projection apparatus comprising: a radiation system (IL) for providing a projection (PB) beam of radiation; a support structure (MT) for supporting patterning means (MA), the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (1) comprising a plurality of protrusions (2) defining a protrusion configuration for providing a substantially flat plane of support for supporting a substantially flat substrate, the substrate holder (1) comprising at least one clamping electrode (8) for generating an electric field, for clamping a substrate against the substrate holder (1) by said electric field; the substrate holder (1) further comprising a peripheral supporting edge (3) arranged to contact a substrate; and a projection system (PL) for projecting the patterned beam onto a target portion of the substrate. According to the invention, the said at least one electrode (8) extends beyond said peripheral supporting edge.
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公开(公告)号：EP1498780A2
公开(公告)日：2005-01-19
申请号：EP04077030.7
申请日：2004-07-13
IPC分类号： G03F7/20
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic projection apparatus comprising: a radiation system (IL) for providing a projection (PB) beam of radiation; a support structure (MT) for supporting patterning means (MA), the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (1) comprising a plurality of protrusions (2) defining a protrusion configuration for providing a substantially flat plane of support for supporting a substantially flat substrate, the substrate holder (1) comprising at least one clamping electrode (8) for generating an electric field, for clamping a substrate against the substrate holder (1) by said electric field; the substrate holder (1) further comprising a peripheral supporting edge (3) arranged to contact a substrate; and a projection system (PL) for projecting the patterned beam onto a target portion of the substrate. According to the invention, the said at least one electrode (8) extends beyond said peripheral supporting edge.
摘要翻译： 一种光刻投影设备，包括：用于提供投影（PB）辐射束的辐射系统（IL） 用于支撑图案形成装置（MA）的支撑结构（MT），所述图案形成装置用于根据期望的图案图案化投影光束; （1），其包括限定用于提供用于支撑基本平坦的衬底的基本上平坦的支撑平面的突起配置的多个突起（2），所述衬底保持器（1）包括至少一个用于产生 用于通过所述电场将衬底夹持在衬底支架（1）上的电场; 所述衬底保持器（1）还包括被布置为接触衬底的外围支撑边缘（3） 和用于将图案化的光束投影到衬底的目标部分上的投影系统（PL）。 根据本发明，所述至少一个电极（8）延伸超过所述周边支撑边缘。
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