发明公开
- 专利标题: Substrate rotating apparatus
- 专利标题(中): Substratdrehvorrichtung
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申请号: EP01113981.3申请日: 2001-06-08
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公开(公告)号: EP1162651A2公开(公告)日: 2001-12-12
- 发明人: Shinozaki, Hiroyuki
- 申请人: EBARA CORPORATION
- 申请人地址: 11-1, Haneda Asahi-cho Ohta-ku, Tokyo JP
- 专利权人: EBARA CORPORATION
- 当前专利权人: EBARA CORPORATION
- 当前专利权人地址: 11-1, Haneda Asahi-cho Ohta-ku, Tokyo JP
- 代理机构: Wagner, Karl H., Dipl.-Ing.
- 优先权: JP2000173689 20000609
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
An apparatus for rotating a semiconductor substrate is provided which comprises a substrate holder for carrying the substrate thereon, a rotor for directly or indirectly supporting the substrate holder, a magnetic floating mechanism for magnetically floating and supporting the rotor in a non-contact state, and magnetic rotating mechanism for magnetically rotating the rotor. The magnetic floating mechanism and magnetic rotating mechanism are formed as a single integral unit structure. The unit structure includes a first set of windings for generating a magnetic field to provide the rotor with a rotating force, and a second set of windings for generating a magnetic field to float and support the rotor at a predetermined position. The first and second sets of windings are disposed on a single yoke plate made of a magnetic material.
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