发明公开
- 专利标题: SEMICONDUCTOR WAFER PROCESSING SYSTEM WITH VERTICALLY-STACKED PROCESS CHAMBERS AND SINGLE-AXIS DUAL-WAFER TRANSFER SYSTEM
- 专利标题(中): 晶圆堆焊工艺和单轴双晶片传输系统的半导体晶圆加工系统
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申请号: EP00918219.7申请日: 2000-03-21
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公开(公告)号: EP1166180A1公开(公告)日: 2002-01-02
- 发明人: SAVAGE, Richard, N. , MENAGH, Frank, S. , CARVALHEIRA, Helder, R. , TROIANI, Philip, A. , COSSENTINE, Dan, L. , VAUGHAN, Eric, R. , MAYER, Bruce, E.
- 申请人: Silicon Valley Group Thermal Systems LLC
- 申请人地址: 440 Kings Valley Road Scotts Valley, CA 95066 US
- 专利权人: Silicon Valley Group Thermal Systems LLC
- 当前专利权人: Silicon Valley Group Thermal Systems LLC
- 当前专利权人地址: 440 Kings Valley Road Scotts Valley, CA 95066 US
- 代理机构: McLeish, Nicholas Alistair Maxwell
- 优先权: US127532P 19990402; US127650P 19990402; US483945 20000113
- 国际公布: WO0060414 20001012
- 主分类号: G03D5/00
- IPC分类号: G03D5/00 ; H01L21/31
摘要:
A semiconductor wafer processing system including a multi-chamber module having vertically-stacked semiconductor wafer process chambers and a loadlock chamber dedicated to each semiconductor wafer process chamber. Each process chamber includes a chuck for holding a wafer during wafer processing. The multi-chamber modules may be oriented in a linear array. The system further includes an apparatus having a dual-wafer single-axis transfer arm including a monolithic arm pivotally mounted within said loadlock chamber about a single pivot axis. The apparatus is adapted to carry two wafers, one unprocessed and one processed, simultaneously between the loadlock chamber and the process chamber. A method utilizing the disclosed system is also provided.
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