发明公开
EP1167875A2 Method and device for modifying the irradiance distribution of a radiation source 有权
的方法和装置,用于改变辐射源的光强度分布

  • 专利标题: Method and device for modifying the irradiance distribution of a radiation source
  • 专利标题(中): 的方法和装置,用于改变辐射源的光强度分布
  • 申请号: EP01660072.8
    申请日: 2001-04-25
  • 公开(公告)号: EP1167875A2
    公开(公告)日: 2002-01-02
  • 发明人: Hyvärinen, JaakkoStenman, Folke
  • 申请人: Fortum OYJ
  • 申请人地址: Keilaniemi 02150 Espoo FI
  • 专利权人: Fortum OYJ
  • 当前专利权人: Fortum OYJ
  • 当前专利权人地址: Keilaniemi 02150 Espoo FI
  • 代理机构: Lipsanen, Jari Seppo Einari
  • 优先权: FI20001010 20000428
  • 主分类号: F21V9/00
  • IPC分类号: F21V9/00
Method and device for modifying the irradiance distribution of a radiation source
摘要:
The invention is related to a method and apparatus for modifying the irradiation distribution of a radiation source. In accordance with the method the radiation source (1) is used to direct radiation to an essentially planar target surface (6). In accordance with the invention between the radiation source (1) and the target surface (6), several plates (4), which are essentially transparent to the radiation and have spaces between them, are placed close to the radiation source (1), in order to use the reflection and absorption of the transparent plates (4) to attenuate the radiation to desired areas.
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