发明公开
- 专利标题: SECONDARY ELECTRON SPECTROSCOPY METHOD AND SYSTEM
- 专利标题(中): 方法和系统进行二次电子能谱
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申请号: EP00932327.0申请日: 2000-05-12
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公开(公告)号: EP1179217A1公开(公告)日: 2002-02-13
- 发明人: SHACHAL, Dov , DOTAN, Noam
- 申请人: Applied Materials, Inc.
- 申请人地址: 3050 Bowers Avenue Santa Clara, California 95054 US
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: 3050 Bowers Avenue Santa Clara, California 95054 US
- 代理机构: Bayliss, Geoffrey Cyril
- 优先权: US312271 19990514
- 国际公布: WO0070646 20001123
- 主分类号: H01J37/26
- IPC分类号: H01J37/26 ; G01N23/22 ; H01J37/252 ; H01J37/28
摘要:
A system and a method for fast characterization of sample's material composition, which is especially beneficial for semiconductor fabrication. The material composition is characterized by analyzing secondary electrons emission from the sample. According to one feature, electron detector is used to collect secondary electrons emanating from the sample. The detector is controlled to collect a specific narrow band of secondary electrons, and the band is controlled to allow for collection of SE at different energies. Two modes are disclosed: spot mode and secondary electron spectroscopy material imaging (SESMI). In the spot mode, a spectrum of SE is obtained from a single spot on the sample, and its characteristics are investigated to obtain information of the material composition of the spot. In the SESMI mode, an SEM image of an area on the sample is obtained. The SE spectrum at each pixel is investigated and correlated to a particular spectrum group. The image is then coded according to the SE spectrum grouping. The coding is preferably a color coding.
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