发明公开
EP1213260A2 Process for manufacturing micromechanical and microoptomechanical structures with pre-applied patterning
有权
一种制备具有所施加的图案的微机械和microoptomechanical结构过程
- 专利标题： Process for manufacturing micromechanical and microoptomechanical structures with pre-applied patterning
- 专利标题（中）： 一种制备具有所施加的图案的微机械和microoptomechanical结构过程
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申请号： EP01128169.8申请日： 2001-11-27
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公开(公告)号： EP1213260A2公开(公告)日： 2002-06-12
- 发明人: Scharf, Bruce R. , Gulvin, Peter M. , Chen, Jingkuang , Kubby, Joel A. , Lin, Chuang-Chia , Tran, Alex T.
- 申请人： MICROSCAN SYSTEMS INCORPORATED , XEROX CORPORATION
- 申请人地址： 1201 SW 7th Street Renton, Washington 98055 US
- 专利权人： MICROSCAN SYSTEMS INCORPORATED,XEROX CORPORATION
- 当前专利权人： MICROSCAN SYSTEMS INCORPORATED,XEROX CORPORATION
- 当前专利权人地址： 1201 SW 7th Street Renton, Washington 98055 US
- 代理机构： Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
- 优先权： US724506 20001127
- 主分类号： B81B3/00
- IPC分类号： B81B3/00
摘要：
The present invention provides a micromechanical or microoptomechanical structure. The structure is produced by a process comprising defining a pattern on a single crystal silicon layer separated by an insulator layer from a substrate layer; defining a structure in the single-crystal silicon layer; depositing and etching a polysilicon layer on the single crystal silicon layer, with remaining polysilcon forming mechanical or optical elements of the structure; and releasing the formed structure.
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