发明公开
- 专利标题： MATERIALS HAVING LOW DIELECTRIC CONSTANTS AND METHODS OF MAKING
- 专利标题（中）： 材料和方法具有低介电常数的
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申请号： EP01924213申请日： 2001-03-20
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公开(公告)号： EP1317775A4公开(公告)日： 2009-01-28
- 发明人: VENKATRAMAN CHANDRA , BRODBECK CYNDI L
- 申请人： BEKAERT SA NV
- 专利权人： BEKAERT SA NV
- 当前专利权人： BEKAERT SA NV
- 优先权： US19065100 2000-03-20
- 主分类号： H01L21/312
- IPC分类号： H01L21/312 ; H01L23/58 ; H01L21/469
摘要：
The invention relates to a material including carbon, oxygen, silicon and hydrogen and having a dielectric constant of from about 2.1 to about 3.0 where an FTIR scan of the material includes at least two major peaks signifying Si-CH3 bonding. The invention further relates to a material which has a variable dielectric constant through the thickness of the material. Another aspect of the invention is the method of making the material.
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