A device (1) for the inspection of one or a plurality of moving surfaces (8), more particularly for the inspection of a rotating surface (8) of a silicon wafer (13). The device comprises at least a laser light source (1) and a beam splitter (4) for splitting a light beam (2) that is emitted by said light source (1) into at least two sub-beams (5, 6) that interfere with one another so as to produce an interference pattern (10) on the surface (8) to be inspected. The device is arranged so that the interference pattern (10) contains a plurality of lines (11) of maximum intensity and lines (12) of minimum intensity, said lines extending essentially transversely of the direction of movement of the surface (8).