发明公开
EP1337700A1 CVD-REAKTOR MIT VON EINEM GASSTROM DREHGELAGERTEN UND -ANGETRIEBENEN SUBSTRATHALTER
有权
与所述旋转气流CVD反应器并存储-ANGETRIEBENEN衬底支架
- 专利标题： CVD-REAKTOR MIT VON EINEM GASSTROM DREHGELAGERTEN UND -ANGETRIEBENEN SUBSTRATHALTER
- 专利标题（英）： Cvd reactor comprising a substrate holder rotatably mounted and driven by a gas flow
- 专利标题（中）： 与所述旋转气流CVD反应器并存储-ANGETRIEBENEN衬底支架
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申请号： EP01978454.5申请日： 2001-10-25
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公开(公告)号： EP1337700A1公开(公告)日： 2003-08-27
- 发明人: KÄPPELER, Johannes , WISCHMEYER, Frank , BERGE, Rune
- 申请人： Aixtron AG
- 申请人地址： Kackertstrasse 15-17 52072 Aachen DE
- 专利权人： Aixtron AG
- 当前专利权人： Aixtron AG
- 当前专利权人地址： Kackertstrasse 15-17 52072 Aachen DE
- 代理机构： Grundmann, Dirk, Dr.
- 优先权： DE10055182 20001108
- 国际公布： WO02038839 20020516
- 主分类号： C30B25/10
- IPC分类号： C30B25/10 ; C30B25/14
摘要：
The invention relates to a device for depositing layers, particularly crystalline layers, onto substrates. Said device comprises a process chamber (2) arranged in a reactor housing (1) where the floor (3) thereof, comprises at least one substrate holder (6) which is rotatably driven by a gas flow flowing in a feed pipe (5) associated with said floor. Said substrate holder is disposed in a bearing cavity (4) on a gas cushion and held in place thereby. The aim of the invention is to technologically improve the design of a substrate holder which is rotatably mounted in a gas flow, particularly in a linear cross-flowing process chamber. Said bearing cavity (4) is associated with a tray-shaped element (8) arranged below the outflow (7) of the feed pipe (5).
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