发明公开
- 专利标题: TRENCH SCHOTTKY RECTIFIER
- 专利标题(中): TRENCH肖特基整流器
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申请号: EP02739587.0申请日: 2002-05-31
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公开(公告)号: EP1393379A1公开(公告)日: 2004-03-03
- 发明人: HSHIEH, Fwu-Iuan , SO, Koon, Chong
- 申请人: GENERAL SEMICONDUCTOR, Inc.
- 申请人地址: 10 Melville Park Road Melville, NY 11747-3113 US
- 专利权人: GENERAL SEMICONDUCTOR, Inc.
- 当前专利权人: GENERAL SEMICONDUCTOR, Inc.
- 当前专利权人地址: 10 Melville Park Road Melville, NY 11747-3113 US
- 代理机构: Lüke, Dierck-Wilm
- 优先权: US872926 20010601
- 国际公布: WO2002099889 20021212
- 主分类号: H01L29/47
- IPC分类号: H01L29/47
摘要:
a schottky rectifier is provided. The Schottky rectifier comprises: (A) a semiconductor region having first and second opposing faces, with the semiconductor region comprising a cathode region (12C) of first conductivity type adjacent the first face (12A) and a drift region(12D) of the first conductivity type adjacent the second face, and with the drift region having a lower net doping concentration than that of the cathode region; (B) one or more trenches extending from the second face (12B) into the semiconductor region and defining one or more mesas (14) within the semiconductor region; (C) an insulating region (16) adjacent the semiconductor region in lower portions of the trench; (D) and an anode electrode (18) that is (I) adjacent to and forms a schottky rectifying contact with the semiconductor at the second face (12), (II) adjacent to and forms a schottky rectifying contact with the semiconductor region within upper portions of the trench and (III) adjacent to the insulating region (16) within the lower portions of the trench.
公开/授权文献
- EP1393379B1 TRENCH SCHOTTKY RECTIFIER 公开/授权日:2011-12-21
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