发明授权
EP1395878B1 PHOTORESISTS PROCESSABLE UNDER BIOCOMPATIBLE CONDITIONS FOR MULTI-BIOMOLECULE PATTERNING
有权
条件下加工的生物相容性光刻胶于产生生物分子格局
- 专利标题： PHOTORESISTS PROCESSABLE UNDER BIOCOMPATIBLE CONDITIONS FOR MULTI-BIOMOLECULE PATTERNING
- 专利标题（中）： 条件下加工的生物相容性光刻胶于产生生物分子格局
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申请号： EP02727805.0申请日： 2002-05-30
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公开(公告)号： EP1395878B1公开(公告)日： 2009-07-08
- 发明人: ARGITIS, Panagiotis , MISIAKOS, Konstantinos , KAKABAKOS, Sotirios, E. Inst. of Radioisotopes and , DOUVAS, Antonios , DIAKOUMAKOS, Constantinos D.
- 申请人： National Center for Scientific Research Demokritos , Argitis, Panagiotis , Misiakos, Konstantinos , Kakabakos, Sotirios E. , Douvas, Antonios , Diakoumakos, Constantinos D.
- 申请人地址： Terma Patriarchou Gregoriou 15310 Aghia Paraskevi, Attiki GR
- 专利权人： National Center for Scientific Research Demokritos,Argitis, Panagiotis,Misiakos, Konstantinos,Kakabakos, Sotirios E.,Douvas, Antonios,Diakoumakos, Constantinos D.
- 当前专利权人： National Center for Scientific Research Demokritos,Argitis, Panagiotis,Misiakos, Konstantinos,Kakabakos, Sotirios E.,Douvas, Antonios,Diakoumakos, Constantinos D.
- 当前专利权人地址： Terma Patriarchou Gregoriou 15310 Aghia Paraskevi, Attiki GR
- 代理机构： Malamis, Alkisti-Irene
- 优先权： GR2001100271 20010531
- 国际公布： WO2002097533 20021205
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; G03F7/40 ; G01N33/552 ; G01N33/545
摘要：
Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and analogous resists for biomolecule layer patterning on solid substrates are also described. The processes described enable micropatterning of more than two different proteins on solid substrates without denaturation of the proteins. The preferred resist materials are based on (meth)acrylate copolymers that contain at least one acid cleavable ester group and at least one hydrophilic group such as an alcoholic or a carboxylic group.
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