发明公开
- 专利标题: MESSANORDNUNG
- 专利标题(英): Measuring array
-
申请号: EP02800094.1申请日: 2002-09-18
-
公开(公告)号: EP1397671A2公开(公告)日: 2004-03-17
- 发明人: DOBSCHAL, Hans-Jürgen , STEINER, Reinhard , BISCHOFF, Jörg
- 申请人: Carl Zeiss Microelectronic Systems GmbH
- 申请人地址: Carl-Zeiss-Promenade 10 07745 Jena DE
- 专利权人: Carl Zeiss Microelectronic Systems GmbH
- 当前专利权人: Carl Zeiss Microelectronic Systems GmbH
- 当前专利权人地址: Carl-Zeiss-Promenade 10 07745 Jena DE
- 代理机构: Grimm, Christian Jan Rainer
- 优先权: DE10146944 20010924
- 国际公布: WO2003029793 20030410
- 主分类号: G01N21/55
- IPC分类号: G01N21/55 ; G01N21/21
摘要:
The invention relates to a measuring array having a radiation source (10), a deflecting device (5) arranged downstream thereof, which can be hit by a ray (2) coming out of the radiation source (1) and which deflects said ray successively in time in different directions. Said array also comprises a first and a second optical device (9, 10) and a detector (6), wherein the first optical device (9) deflects the rays coming from the deflecting device (5) in the form of measuring rays to a point (P) of a sample (11) that is to be arranged in a measuring position in such a way that the angle of incidence of the measuring ray on the sample (11) varies depending on the direction. The sample rays coming out of the sample (11) due to the interaction between the measuring rays and the sample are deflected by the second optical device (10) onto the detector (11). At least one of the two optical devices (9, 10) has a diffracting element (7) for deflection, said element diffracting the incident rays coming from different directions in such a way that the rays diffracted in a given diffraction order are focused on a point (P, D).
信息查询