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1.发明公开
公开(公告)号：EP1373969A1
公开(公告)日：2004-01-02
申请号：EP02767491.0
申请日：2002-09-18
CPC分类号： G02B5/0221 , G02B5/0284 , G02B27/48
摘要： The invention relates to an array for reducing the coherence of a coherent radiation beam (6), wherein a reflector (1) defining an inner space is provided with a diffusely reflecting inner surface (4), wherein said reflector (1) has an inlet hole (2) through which the radiation beam (6) can be injected into the inner space, in addition to an outlet hole (3) through which the rays of the radiation beam (6) can come out after at least one reflection on the inner surface (4).
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2.发明授权Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop 有权为一个，基于极紫外（EUV）辐射显微镜的成像系统
公开(公告)号：EP1471539B1
公开(公告)日：2006-08-23
申请号：EP03016371.1
申请日：2003-07-19
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3.发明公开
公开(公告)号：EP1471539A1
公开(公告)日：2004-10-27
申请号：EP03016371.1
申请日：2003-07-19
发明人： Dobschal, Hans-Jürgen , Greif-Wüstenbecker, Jörn , Brunner, Robert , Rosenkranz, Norbert , Scherübl, Thomas
摘要： Die vorliegende Erfindung betrifft ein reflektives Abbildungssystem für ein Röntgenmikroskop zur Untersuchung eines Objektes in einer Objektebene, wobei das Objekt mit Strahlen einer Wellenlänge
Bei dem erfindungsgemäßen Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop mit Wellenlängen im Bereich
Mit der erfindungsgemäßen Anordnung wird ein Abbildungssystem zur Verfügung gestellt, welches die im Stand der Technik bekannten Nachteile vermeidet und eine hohe Abbildungsgüte gewährleistet. Der Fertigungsaufwand bleibt durch die ausschließlich Verwendung sphärischer Spiegel vertretbar.摘要翻译： 显微镜的波长小于100nm，特别是小于30nm，即EUV（极紫外）或X射线。 显微镜可以以0.1至1000x的放大倍率进行操作。 显微镜被包含在真空室内以避免透射光的吸收。 来自物体（1）的光从第一反射镜（2）反射，第一反射镜（2）可以是稍微凹入，非球面并且可以具有约240线/ mm的反射衍射光栅。 然后光从第二反射镜（3）反射，第二反射镜（3）可以是具有约660线/ mm的衍射结构的球形凸起。 物体与中间焦点（4）之间的距离小于5米。
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公开(公告)号：EP1397671A2
公开(公告)日：2004-03-17
申请号：EP02800094.1
申请日：2002-09-18
CPC分类号： G01N21/55 , G01N21/211 , G01N21/4788 , G01N2021/4711 , G01N2021/4714 , G01N2021/4735 , G01N2021/4792 , G01N2201/0635
摘要： The invention relates to a measuring array having a radiation source (10), a deflecting device (5) arranged downstream thereof, which can be hit by a ray (2) coming out of the radiation source (1) and which deflects said ray successively in time in different directions. Said array also comprises a first and a second optical device (9, 10) and a detector (6), wherein the first optical device (9) deflects the rays coming from the deflecting device (5) in the form of measuring rays to a point (P) of a sample (11) that is to be arranged in a measuring position in such a way that the angle of incidence of the measuring ray on the sample (11) varies depending on the direction. The sample rays coming out of the sample (11) due to the interaction between the measuring rays and the sample are deflected by the second optical device (10) onto the detector (11). At least one of the two optical devices (9, 10) has a diffracting element (7) for deflection, said element diffracting the incident rays coming from different directions in such a way that the rays diffracted in a given diffraction order are focused on a point (P, D).
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公开(公告)号：EP1373961A2
公开(公告)日：2004-01-02
申请号：EP02787138.3
申请日：2002-07-19
发明人： ENGEL, Thomas
CPC分类号： G02B21/02 , G02B21/362
摘要： A microscope lens arrangement consisting of a microscope lens (1) which can be placed in a working position in such a way that a sample (7) arranged in the field of view of said microscope lens (1) can be detected . A video camera (12; 22; 25; 32) which is coupled to the microscope lens (1) is provided. Said video camera can detect at least one part of the field of view without the aid of the lens when the microscope lens (1) is in a working position.
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6.发明公开Reflektives Röntgenmikroskop und Inspektionssystem zur Untersuchung von Objekten mit Wellenlängen 100nm 审中-公开ReflektivesRöntgenmikroskopund Inspektionssystem zur Untersuchung von Objekten mitWellenlängen100nm
公开(公告)号：EP1455365A2
公开(公告)日：2004-09-08
申请号：EP04013866.1
申请日：2003-05-08
发明人： Mann, Hans-Jürgen , Engel, Thomas Dr. , Dinger, Udo , Zibold, Axel Dr. , Ulrich, Wilhelm , Harnisch, Wolfgang , Reinecke, Wolfgang Dr , Wedowski, Marco , Pauschinger, Dieter
摘要： Die Erfindung betrifft ein Inspektionssystem für die Untersuchung von Objekten, insbesondere Masken für die Mikrolithographie mit Wellenlängen
einem Beleuchtungssystem zur Ausleuchtung eines Feldes in einer Objektebene (1), wobei
in der Objektebene innerhalb des ausgeleuchteten Feldes das zu untersuchende Objekt angeordnet ist;
einem Abbildungssystem für Wellenlängen ≤ 100 nm zur vergrößernden Abbildung wenigstens eines Ausschnittes des Objektes in eine Bildebene (3);
einem in der Bildebene (3) angeordneten Bildaufnahmesystem.摘要翻译： 具有以光轴（HA）为中心的第一凹面镜（S1）和第二凸面镜（S2）的第一子系统配合在从物平面到像平面的光束路径中，并且具有用于波长较小的第一光学元件 超过30nm。 第一图像（Z）形成在第一图像平面（2）中。 第二个子系统适合第一个图像之后的光束路径。 还包括以下独立权利要求：（a）检查对象的检查系统，例如 用于微波光刻的掩模，其波长小于100nm，优选小于30nm; （b）用于检查物体的方法，例如 用于微波光刻的掩模，其波长小于100nm。
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7.发明公开REFLEKTIVES ROENTGENMIKROSKOP UND INSPEKTIONSSYSTEM ZUR UNTERSUCHUNG VON OBJEKTEN MIT WELLENLAENGEN 100NM 有权反光ROENTGENMIKROSKOP的对象与Wellenlaengen = 100NM反射调查
公开(公告)号：EP1446813A2
公开(公告)日：2004-08-18
申请号：EP03740130.4
申请日：2003-05-08
发明人： MANN, Hans-Jürgen , DINGER, Udo , ULRICH, Wilhelm , REINECKE, Wolfgang , ENGEL, Thomas , ZIBOLD, Axel , HARNISCH, Wolfgang , WEDOWSKI, Marco , PAUSCHINGER, Dieter
摘要： The invention relates to a reflective X-ray microscope for examining an object on an object plane wherein the object is illuminated with radiation at a wavelength of
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公开(公告)号：EP1434977A1
公开(公告)日：2004-07-07
申请号：EP02785122.9
申请日：2002-09-18
CPC分类号： G01J4/00 , G01J3/28 , G01N21/211 , G01N21/47
摘要： The invention relates to a measuring array having an optical device into which a radiation beam (10) departing and diverging from a sample is injected for measurement and a detector (13) arranged downstream of said optical device, said detector having a plurality of detector pixels which are arranged on a plane and can be evaluated separately from one another, wherein the optical device (11) spectrally splits the diverging radiation beam (10) in a first direction crosswise to the direction of propagation of the radiation beam (10) and directs it towards the detector (13). The optical device parallelizes the radiation beam before it strikes the detector (13) in a second direction crosswise to the direction of propagation in such a manner that adjacent rays in the second direction of the radiation beam striking the detector (13) are parallel relative to one another.
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公开(公告)号：EP1329760A3
公开(公告)日：2004-04-28
申请号：EP02025338.1
申请日：2002-11-13
发明人： Engel,Thomas,Dr.
CPC分类号： G02B27/48
摘要： Zur Verminderung des Speckle-Kontrastes ist vorgesehen in ein Kohärenzminderer mit mindestens einem doppelbrechenden Element (2), das ein zugeführtes kohärentes Strahlenbündel (1) in zwei Teilstrahlbündel (5, 6) aufteilt, die in senkrecht zueinander liegenden Polarisationsrichtungen (7, 8) polarisiert sind, wobei das doppelbrechende Element (2) die Teilstrahlbündel (5, 6) in Strahlrichtung und/oder quer zur Strahlrichtung gegeneinander versetzt abgibt.
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公开(公告)号：EP1543375A1
公开(公告)日：2005-06-22
申请号：EP03798901.9
申请日：2003-09-11
发明人： MENCK, Alexander , BISCHOFF, Jörg
CPC分类号： G02B27/144 , G02B27/143 , G02B27/48
摘要： The invention relates to a device for reducing the coherence of a beam of light, especially a laser beam, for illuminating an image surface or a sample. According to the invention, said device comprises a beam splitter (2) whereon an incident beam (1) is split into two orthogonal partial beams (4,6), and two reflecting elements whereof at least one is embodied in the form of a reversing prism (7). One partial beam (4,6) is respectively directed at a reflecting element and is reflected therefrom back to the beam splitter (2). The reflected elements are positioned at various distances from the beam splitter (2) such that the partial beams (4,6) pass once more through the beam splitter (2) in an opposite direction and are combined to form an outgoing beam (8) wherein the coherence is reduced.
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