AbstractThe present invention provides a process for manufacturing a porous metal electrode, wherein the porosity degree is in the range of 30 to 50% and the metal is capable of forming a stable, uniform, oxide layer having a dielectric constant equal to or greater than 20 (ε ≥ 20), preferably selected from the group consisting of tantalum and niobium, comprising a substantially uniform porous layer of deposited said metal particles thereon. The present invention further relates to a stable suspension for electrophoretically homogeneously deposition of said metal.