发明公开
- 专利标题: CONTAINER FOR PRECISION SUBSTRATE
- 专利标题(中): 容器精密基板
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申请号: EP02760759申请日: 2002-08-28
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公开(公告)号: EP1429380A4公开(公告)日: 2009-07-15
- 发明人: OHMI TADAHIRO , JIMBO T , MURAKAMI T
- 申请人: ZEON CORP , OHMI TADAHIRO
- 专利权人: ZEON CORP,OHMI TADAHIRO
- 当前专利权人: ZEON CORP,OHMI TADAHIRO
- 优先权: JP2001257460 2001-08-28
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/673
摘要:
A container for a precision substrate, which has at least one component formed from a thermoplastic resin, characterized in that it satisfies the following characteristics [1] and [2]: [1] when a flow of an ultra-high pure argon gas impurity content: 1 ppb or less is continuously contacted with the container with a flow rate of 1.2 L/min, the argon gas has a moisture content of 30 ppb per 1 cm2 of the surface area of the component 30 min after the start of contacting [2] when the container is placed in air at 100ringC, the amount of the organic materials in the air which is increased in the period of 300 min. is 150 ng or less per 1 g of the weight of the component. The container can satisfy the requirement of low staining for a container for a precision substrate.
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