发明公开
- 专利标题： SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM
- 专利标题（中）： 食品乳制品麻省理工学院
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申请号： EP02757140申请日： 2002-08-16
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公开(公告)号： EP1430573A4公开(公告)日： 2006-07-05
- 发明人: WATSON TOM A , UJAZDOWSKI RICHARD C , IVASCHENKO ALEX P , SHANNON ROBERT A , SANDSTROM RICHARD L , WEBB ROBERT KYLE , PALENSCHAT FREDERICK A , HOFMANN THOMAS , RETTIG CURTIS L , NESS RICHARD L , MELCHER PAUL C , ERSHOV ALEXANDER I
- 申请人： CYMER INC
- 专利权人： CYMER INC
- 当前专利权人： CYMER INC
- 优先权： US94334301 2001-08-29; US2931901 2001-10-17; US1200201 2001-11-30; US3667601 2001-12-21; US14121602 2002-05-07; US18733602 2002-06-28
- 主分类号： H01S3/134
- IPC分类号： H01S3/134 ; H01S3/225 ; G03F7/20 ; H01S3/00 ; H01S3/036 ; H01S3/038 ; H01S3/04 ; H01S3/041 ; H01S3/08 ; H01S3/097 ; H01S3/0971 ; H01S3/0975 ; H01S3/102 ; H01S3/104 ; H01S3/105 ; H01S3/1055 ; H01S3/11 ; H01S3/13 ; H01S3/131 ; H01S3/137 ; H01S3/139 ; H01S3/22 ; H01S3/223 ; H01S3/23
摘要：
The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,000 pulses per second. Preferred embodiments are configured as KrF, ArF and F2 lasers used in photolithography. Improvements include a suction fan (555) in the immediate vicinity of the anode (542) to increase gas flow. The intake of the fan (555) is between the anode (542) and the insulating spacer (544B).
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