发明公开
- 专利标题: High flux x-ray source
- 专利标题(中): 高通量的X射线源
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申请号: EP03257992.2申请日: 2003-12-18
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公开(公告)号: EP1462794A3公开(公告)日: 2006-04-19
- 发明人: Kucharczyk, Damian
- 申请人: Oxford Diffraction Limited
- 申请人地址: 20 Nuffield Way Abingdon, Oxfordshire OX14 1RL GB
- 专利权人: Oxford Diffraction Limited
- 当前专利权人: Oxford Diffraction Limited
- 当前专利权人地址: 20 Nuffield Way Abingdon, Oxfordshire OX14 1RL GB
- 代理机构: Finnie, Peter John
- 优先权: GB0306829 20030325
- 主分类号: G01N23/00
- IPC分类号: G01N23/00 ; H01J35/00 ; H05G1/04
摘要:
The present invention provides a high flux X-ray source 100 comprising a sealed X-ray tube contained within an X-ray shield (101), an optic housing 103 containing a multi-layer optic for collecting and focussing X-rays generated in the sealed X-ray tube, and an X-ray beam conditioner 104. The multi-layer optic 103 is located at a predetermined distance from the sealed X-ray tube 101, with the optic housing 103 being adjustable relative to the sealed X-ray tube 101 and the beam conditioner 104 adjustable relative to the optic housing 103. The use of a multi-layer optic provides for the efficient collection and focussing of X-rays generated in a compact sealed tube and wavelength selectively enables it to act as a monochromator, providing a beam of X-rays with a predetermined range of photon energy.
公开/授权文献
- EP1462794B2 High flux x-ray source 公开/授权日:2017-08-30
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