发明公开
EP1555668A1 Recording method and recording alloy
有权
Aufzeichnungsverfahren und Aufzeichnungslegierung
- 专利标题： Recording method and recording alloy
- 专利标题（中）： Aufzeichnungsverfahren und Aufzeichnungslegierung
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申请号： EP05007990.4申请日： 2003-01-29
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公开(公告)号： EP1555668A1公开(公告)日： 2005-07-20
- 发明人: Ohkura, Hiroko , Kageyama, Yoshiyuki , Harigaya, Makoto , Yuzurihara, Hajime , Hibino, Eiko , Miura, Hiroshi , Mizutani, Miku
- 申请人： Ricoh Company, Ltd.
- 申请人地址： 3-6, Nakamagome 1-chome, Ohta-ku Tokyo 143-8555 JP
- 专利权人： Ricoh Company, Ltd.
- 当前专利权人： Ricoh Company, Ltd.
- 当前专利权人地址： 3-6, Nakamagome 1-chome, Ohta-ku Tokyo 143-8555 JP
- 代理机构： Barz, Peter, Dr.
- 优先权： JP2002021361 20020130
- 主分类号： G11B7/24
- IPC分类号： G11B7/24 ; G11B7/125 ; G11B7/00 ; G11B20/14
摘要：
An optical recording medium comprises
a substrate;
a recording layer located overlying the substrate, wherein the recording layer has the formula GeαGaβSbγTe100-α-β-γ, wherein α is a number of from 1 to 5 in units of atomic percent, β is a number of from 1 to 5 in units of atomic percent, and γ is a number of from 70 to 81 in units of atomic percent; and
a reflection layer located overlying the recording layer.
a substrate;
a recording layer located overlying the substrate, wherein the recording layer has the formula GeαGaβSbγTe100-α-β-γ, wherein α is a number of from 1 to 5 in units of atomic percent, β is a number of from 1 to 5 in units of atomic percent, and γ is a number of from 70 to 81 in units of atomic percent; and
a reflection layer located overlying the recording layer.
公开/授权文献
- EP1555668B1 Recording method and recording alloy 公开/授权日：2007-06-06
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