发明授权
- 专利标题： DUPLEXER AND METHOD OF ISOLATING AN RX-BAND AND A TX-BAND
- 专利标题（中）： 双面打印和隔离程序RX带内和带Tx
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申请号： EP03758528.8申请日： 2003-10-31
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公开(公告)号： EP1565984B1公开(公告)日： 2011-07-27
- 发明人: LOBEEK, Jan-Willem
- 申请人： NXP B.V.
- 申请人地址： High Tech Campus 60 5656 AG Eindhoven NL
- 专利权人： NXP B.V.
- 当前专利权人： NXP B.V.
- 当前专利权人地址： High Tech Campus 60 5656 AG Eindhoven NL
- 代理机构： Schouten, Marcus Maria
- 优先权： EP02079794 20021119
- 国际公布： WO2004047290 20040603
- 主分类号： H03H9/58
- IPC分类号： H03H9/58 ; H03H9/64
摘要：
A duplexer (1) with two band-pass filters (5, 6) comprising film bulk acoustic wave resonators (FBAR) (8, 9, 10, 11, 12, 13) has an extra antiresonant circuit in order to block the transmission signal. It has an extra resonant circuit in order to allow the desired receive signal to pass. The antiresonant circuit comprises the first FBAR (11) and a parallel inductor (14). The resonant circuit comprises the first FBAR (11) and a series inductor (7).
公开/授权文献
- EP1565984A1 DUPLEXER AND METHOD OF ISOLATING AN RX-BAND AND A TX-BAND 公开/授权日：2005-08-24
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