发明公开
EP1638135A2 Susceptor with surface roughness for high temperature substrate processing
审中-公开
Aufnahmevorrichtung mitOberflächenrauhigkeitzur Hochtemperaturbehandlung von Substraten
- 专利标题： Susceptor with surface roughness for high temperature substrate processing
- 专利标题（中）： Aufnahmevorrichtung mitOberflächenrauhigkeitzur Hochtemperaturbehandlung von Substraten
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申请号： EP05019177.4申请日： 2005-09-03
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公开(公告)号： EP1638135A2公开(公告)日： 2006-03-22
- 发明人: Van Den Berg, Jannes Remco , Grannemann, Ernst H.A.
- 申请人： ASM INTERNATIONAL N.V.
- 申请人地址： Jan van Eycklaan 10 3723 BC Bilthoven NL
- 专利权人： ASM INTERNATIONAL N.V.
- 当前专利权人： ASM INTERNATIONAL N.V.
- 当前专利权人地址： Jan van Eycklaan 10 3723 BC Bilthoven NL
- 代理机构： Sternagel, Fleischer, Godemeyer & Partner
- 优先权： US610993P 20040917
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
Susceptors plates are formed having a minimum surface roughness. The wafer contact surfaces of the susceptor plates have a surface roughness Ra value of about 0.6 µm or more. The contact surface is otherwise flat and lacking in large protrusions. In addition, the susceptors have a low transparency to more closely match the heat absorption properties of the supported wafer. Advantageously, heat transfer from the susceptors to the wafers is highly uniform. Thus, using these susceptors to support the wafers during high temperature semiconductor processing ( e.g. , at > 1000°C) results in no or few crystallographic slip lines being formed on the wafers.
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