发明公开
EP1652866A1 ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS
有权
ACRYLPOLYMERE UND STRAHLUNGSEMPFINDLICHE HARZZUSAMMENSETZUNG
- 专利标题： ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS
- 专利标题（中）： ACRYLPOLYMERE UND STRAHLUNGSEMPFINDLICHE HARZZUSAMMENSETZUNG
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申请号： EP04771184.1申请日： 2004-08-04
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公开(公告)号： EP1652866A1公开(公告)日： 2006-05-03
- 发明人: FUJIWARA, Kouichi , YAMAGUCHI, Hiroshi , NAKAMURA, Atsushi
- 申请人： JSR Corporation
- 申请人地址： 6-10, Tsukiji 5-chome, Chuo-ku Tokyo 104-8410 JP
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： 6-10, Tsukiji 5-chome, Chuo-ku Tokyo 104-8410 JP
- 代理机构： TBK-Patent
- 优先权： JP2003286389 20030805
- 国际公布： WO2005012374 20050210
- 主分类号： C08F220/28
- IPC分类号： C08F220/28 ; G03F7/039 ; H01L21/30
摘要：
To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R" and R‴ are each hydrogen, methyl, or trifluoromethyl; R 1 is hydrogen, C 1-4 linear or branched alkyl, alkoxy, or C 1-4 linear or branched fluoroalkyl; X is a C 7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R 2 and R 3 are each independently C 1-4 linear or branched alkyl; R 4 is a C 4-20 alicyclic hydrocarbon group; R 5 is C 1-4 linear or branched alkyl; and R 6 and R 7 are each hydrogen or C 1-4 linear or branched alkyl.
公开/授权文献
- EP1652866B1 ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS 公开/授权日：2008-12-24
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