公开(公告)号：EP1708027B1

公开(公告)日：2019-03-13

申请号：EP05703585.9

申请日：2005-01-14

申请人： JSR Corporation

发明人： KIMURA, Toru ,  NISHIMURA, Yukio ,  UTAKA, Tomohiro ,  NEMOTO, Hiroaki ,  NAKAMURA, Atsushi ,  CHIBA, Takashi ,  NAKAGAWA, Hiroki

IPC分类号： G03F7/11 ,  G03F7/20 ,  H01L21/027

公开(公告)号：EP2128706A1

公开(公告)日：2009-12-02

申请号：EP08721759.2

申请日：2008-03-11

申请人： JSR Corporation

发明人： NAKAMURA, Atsushi ,  NAGAI, Tomoki ,  ABE, Takayoshi ,  KAKIZAWA, Tomohiro

IPC分类号： G03F7/40 ,  H01L21/027

CPC分类号： G03F7/70466 ,  G03F7/0035 ,  G03F7/0392 ,  G03F7/40 ,  H01L21/0274

摘要： A resist pattern formation method includes (1) a step of forming a first resist pattern which includes forming a first resist layer on a substrate, selectively exposing the first resist layer to radiation through a mask, and developing the exposed first resist layer, (2) a step of insolubilizing the first resist pattern by coating the first resist pattern with a resist pattern insolubilizing resin composition, baking or curing with UV, and developing the resist pattern insolubilizing resin composition, (3) a step of forming a second resist layer on the insolubilized resist pattern and selectively exposing the second resist layer to radiation through a mask, and (4) a step of developing the exposed second resist layer to form a second resist pattern.

摘要翻译： 抗蚀剂图案形成方法包括：（1）形成第一抗蚀剂图案的步骤，该第一抗蚀剂图案包括在基板上形成第一抗蚀剂层，通过掩模选择性地将第一抗蚀剂层暴露于辐射，以及使曝光的第一抗蚀剂层显影 ）通过用抗蚀剂图案不溶化树脂组合物涂布第一抗蚀剂图案，用UV烘烤或固化并使抗蚀剂图案不溶化树脂组合物显影来使第一抗蚀剂图案不溶化的步骤，（3）在第二抗蚀剂图案上形成第二抗蚀剂层的步骤 所述不溶解的抗蚀剂图案并且通过掩模选择性地暴露所述第二抗蚀剂层，以及（4）使所述暴露的第二抗蚀剂层显影以形成第二抗蚀剂图案的步骤。

公开(公告)号：EP1652866A1

公开(公告)日：2006-05-03

申请号：EP04771184.1

申请日：2004-08-04

申请人： JSR Corporation

发明人： FUJIWARA, Kouichi ,  YAMAGUCHI, Hiroshi ,  NAKAMURA, Atsushi

IPC分类号： C08F220/28 ,  G03F7/039 ,  H01L21/30

CPC分类号： C08F220/30 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

摘要： To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R" and R‴ are each hydrogen, methyl, or trifluoromethyl; R 1 is hydrogen, C 1-4 linear or branched alkyl, alkoxy, or C 1-4 linear or branched fluoroalkyl; X is a C 7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R 2 and R 3 are each independently C 1-4 linear or branched alkyl; R 4 is a C 4-20 alicyclic hydrocarbon group; R 5 is C 1-4 linear or branched alkyl; and R 6 and R 7 are each hydrogen or C 1-4 linear or branched alkyl.

摘要翻译： 提供一种在抗蚀剂溶剂中溶解性优异且几乎不依赖于烘烤温度的抗蚀剂，并且可以形成线边缘粗糙度降低的显影图案。 一种丙烯酸类聚合物，其特征在于包含通式（1）的单元，通式（2）的单元和通式（3）的单元和/或通式（4）的单元，其中R，R'，R“ R 1是氢，甲基或三氟甲基; R 1是氢，C 1-4直链或支链烷基，烷氧基或C 1-4直链或支链氟烷基; X是C 7-20多环脂族烃基 由碳原子和氢原子组成; R 2和R 3各自独立地为C 1-4直链或支链烷基; R 4为C 4-20脂环族烃基; R 5为C 1-4直链或支链烷基;和 R 6和R 7各自为氢或C 1-4直链或支链烷基。

公开(公告)号：EP2133747A1

公开(公告)日：2009-12-16

申请号：EP08711659.6

申请日：2008-02-20

申请人： JSR Corporation

发明人： NAGAI, Tomoki ,  NAKAMURA, Atsushi ,  ABE, Takayoshi ,  SUGIURA, Makoto

IPC分类号： G03F7/40 ,  H01L21/027

CPC分类号： G03F7/40

摘要： A resin composition which can increase the pattern shrink rate while maintaining the advantages of capability of effectually and precisely micronizing the resist pattern gaps irrespective of the surface conditions of the substrate and forming resist patterns exceeding the wavelength limit economically at low cost in a good condition having only small defects, and a method of efficiently forming a micropattern using the resin composition are disclosed. The resin composition for forming a micropattern includes a hydroxyl group-containing resin, a crosslinking component, and an alcohol solvent which contains an alcohol and not more than 10 mass% of water relative to the total solvent. The crosslinking component includes a compound having two or more acryloyloxy groups in the molecule.

摘要翻译： 的树脂组合物可以提高图案的收缩率，同时保持有效地能力的优点，并且精确地微粉化，而不管基片的表面状态的抗蚀剂图案的间隙和成形以低成本在具有良好的条件在经济上的抗蚀剂图案超过波长限度 只有小的缺陷，并有效地形成微图案使用该树脂组合物的方法是游离缺失光盘。 用于形成微图案的树脂组合物包括含羟基的树脂，交联组分，和在醇溶剂中在醇与不超过10％，相对于总溶剂水的质量含有。 该交联组分包括具有两个或多个丙烯酰氧基的分子中基团的化合物。

公开(公告)号：EP2131240A1

公开(公告)日：2009-12-09

申请号：EP08722276.6

申请日：2008-03-17

申请人： JSR Corporation

发明人： NISHIMURA, Yukio ,  SAKAI, Kaori ,  MATSUMURA, Nobuji ,  SUGIURA, Makoto ,  NAKAMURA, Atsushi ,  WAKAMATSU, Gouji ,  ANNO, Yuusuke

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/40 ,  H01L21/027

CPC分类号： G03F7/0035 ,  G03F7/0397 ,  G03F7/2024 ,  G03F7/2041 ,  G03F7/40

摘要： A method of patterning using double exposure patterning in a liquid immersion lithographic process is provided. According to the method, the pattern formed in the first layer is made inactive to radiation applied to when forming a second layer pattern, whereby it is possible to form the second layer pattern while maintaining the first layer pattern as is without making it soluble in alkali. The patterning method comprises a step of forming a first pattern on a substrate using a first resist layer forming composition, a step of making the first pattern inactive, a step of forming a second pattern on a substrate on which a pattern has been formed using a second resist layer forming composition and exposing the second resist layer to radiation, and a step of developing the exposed resist layer to form a second pattern in the space area of the first pattern. The first resist layer forming composition contains a cross-linking agent which accelerates conversion of the first layer from positive-working to negative-working.

摘要翻译： 提供了一种使用在液浸光刻工艺双重曝光图案形成图案化的方法。 。根据该方法，在第一层中形成的图案是由惰性的辐射应用于当形成第二层图案，从而能够在保持第一层图案作为是不使其溶于碱性以形成第二层图案 ， 图案化方法包括使用第一抗蚀剂层形成用组合物，使第一图案不活动的一个步骤上的衬底上形成的第一图案的步骤，在衬底上形成的第二图案的步骤在其上的图案已被使用的成形 第二抗蚀剂层形成用组合物和所述第二抗蚀剂层暴露于辐射，并且显影曝光的抗蚀剂步骤层，以形成在所述第一图案的空间区域的第二图案。 第一抗蚀剂层形成用组合物含有从加速所述第一层的转化率的交联剂正型负性工作的。

公开(公告)号：EP1652866B1

公开(公告)日：2008-12-24

申请号：EP04771184.1

申请日：2004-08-04

申请人： JSR Corporation

发明人： FUJIWARA, Kouichi ,  YAMAGUCHI, Hiroshi ,  NAKAMURA, Atsushi

IPC分类号： C08F220/28 ,  G03F7/039 ,  H01L21/30

CPC分类号： C08F220/30 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

摘要： [PROBLEMS] To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. [MEANS FOR SOLVING PROBLEMS] An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R'' and R''' are each hydrogen, methyl, or trifluoromethyl; R is hydrogen, C1-4 linear or branched alkyl, alkoxy, or C1-4 linear or branched fluoroalkyl; X is a C7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R and R are each independently C1-4 linear or branched alkyl; R is a C4-20 alicyclic hydrocarbon group; R is C1-4 linear or branched alkyl; and R and R are each hydrogen or C1-4 linear or branched alkyl.

公开(公告)号：EP1757628A1

公开(公告)日：2007-02-28

申请号：EP05737180.9

申请日：2005-05-02

申请人： JSR Corporation

发明人： NAKASHIMA, Hiromitsu ,  UTAKA, Tomohiro ,  CHIBA, Takashi ,  YONEDA, Eiji ,  NAKAMURA, Atsushi

IPC分类号： C08F220/28 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

CPC分类号： C08F220/28 ,  C08F220/18 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

摘要： A radiation-sensitive resin composition excelling in basic properties as a resist such as sensitivity, resolution, and the like, having a wide depth of focus (DOF) to both a line-and-space pattern and an isolated space pattern, and exhibiting a minimal line width change due to fluctuation of a bake temperature, and having a small line width limit in which the line pattern destroying phenomenon does not occur, and a lactone-containing copolymer useful as a resin component of the composition are provided.
The lactone-containig copolymer is represented by a copolymer of the following compounds (1-1), (2-1), and (3-1).

The radiation-sensitive resin composition comprises (a) the lactone-containing copolymer and (b) a photoacid generator.

摘要翻译： 作为具有对于线间距图案和隔离空间图案两者具有宽的焦深​​（DOF）的，诸如灵敏度，分辨率等的抗蚀剂的基本性能优异的辐射敏感性树脂组合物， 由于烘烤温度的波动引起的线宽变化最小，并且具有不发生线型破坏现象的小线宽限制，并且提供可用作该组合物的树脂成分的含内酯的共聚物。 含有内酯的共聚物由以下化合物（1-1），（2-1）和（3-1）的共聚物表示。 辐射敏感性树脂组合物包含（a）含内酯的共聚物和（b）光致酸产生剂。

公开(公告)号：EP1953595A1

公开(公告)日：2008-08-06

申请号：EP06823478.0

申请日：2006-11-20

申请人： JSR Corporation

发明人： NAKAMURA, Atsushi ,  WANG, Yong ,  TSUJI, Takayuki

IPC分类号： G03F7/039 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/2041 ,  G03F7/0397

摘要： A radiation-sensitive resin composition for liquid immersion lithography which produces an excellent pattern profile, exhibits excellent resolution, provides sufficient focal depth allowance, and elutes only the minimal amount in the liquid when brought in contact with the liquid during exposure to radiation. The radiation-sensitive resin composition forms a photoresist film in liquid immersion lithography, in which radiation is emitted through a liquid for use in liquid immersion lithography having a refractive index larger than 1.44 and smaller than 1.85 at a wavelength of 193 nm, existing between a lens and a photoresist, the composition comprising a resin having a recurring unit with a lactone structure, which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali by the action of an acid, and a radiation-sensitive acid generator.

摘要翻译： 用于液体浸没式光刻的辐射敏感性树脂组合物产生优异的图案轮廓，表现出优异的分辨率，提供足够的焦深允许量，并且在暴露于辐射期间与液体接触时仅在液体中洗脱最少量。 辐射敏感树脂组合物在液浸光刻中形成光致抗蚀剂膜，其中辐射通过用于液体浸没光刻的液体发射，该液体具有在193nm波长处大于1.44且小于1.85的折射率，其存在于 透镜和光致抗蚀剂，所述组合物包含具有内酯结构的重复单元的树脂，其不溶于或几乎不溶于碱，但通过酸的作用变得可溶于碱，以及辐射敏感酸发生剂。

公开(公告)号：EP1602975A1

公开(公告)日：2005-12-07

申请号：EP03789633.9

申请日：2003-12-24

申请人： JSR Corporation

发明人： NISHIMURA, Isao ,  FUJIWARA, Kouichi ,  KOBAYASHI, Eiichi ,  SHIMOKAWA, Tsutomu ,  NAKAMURA, Atsushi ,  YONEDA, Eiji ,  WANG, Yong

IPC分类号： G03F7/004 ,  G03F7/039 ,  C08F4/00

CPC分类号： G03F7/039 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2006

摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.

摘要翻译： 一种辐射敏感树脂组合物，其包含通过活性自由基聚合获得的含酸不稳定基团的树脂和光酸产生剂，其中所述含酸不稳定基团的树脂通过活性自由基聚合获得，所述树脂具有不溶于或几乎不溶于碱但通过酸的作用变为碱溶性的特定结构， 含酸不稳定基团的树脂的重均分子量与数均分子量之比（重均分子量/数均分子量）小于1.5。