发明公开
- 专利标题: INTEGRIERTE ANSCHLUSSANORDNUNG UND HERSTELLUNGSVERFAHREN
- 专利标题(英): Integrated connection arrangement and production method
- 专利标题(中): 集成的连接装置和方法
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申请号: EP04766283.8申请日: 2004-07-21
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公开(公告)号: EP1654760A1公开(公告)日: 2006-05-10
- 发明人: DREXL, Stefan , GÖBEL, Thomas , HELNEDER, Johann , HOMMEL, Martina , KLEIN, Wolfgang , KÖRNER, Heinrich , MITCHELL, Andrea , SCHWERD, Markus , SECK, Martin
- 申请人: Infineon Technologies AG
- 申请人地址: St.-Martin-Strasse 53 81669 München DE
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: St.-Martin-Strasse 53 81669 München DE
- 代理机构: Kindermann, Peter
- 优先权: DE10337569 20030814
- 国际公布: WO2005020321 20050303
- 主分类号: H01L23/485
- IPC分类号: H01L23/485 ; H01L23/532
摘要:
The invention relates to a connection arrangement comprising an outer conductive structure (44), which is at least partially or completely placed inside a recess (37) of an electrically non-conductive insulating layer (34, 36). At the bottom of the recess (37), an inner conductive structure (22) is placed on one side of the insulating layer (34, 36) and, in a contacting area, it borders on the outer conductive structure (44). A contact surface is placed on the outer conductive structure (44) on the other side of the recess (37). The contacting area and the contact surface do not overlap one another or only in part. The bottom of the recess (37) is, when viewed in the normal direction, arranged in such at manner that it overlaps at least half of the contact surface or the entirety thereof so that a step in the insulating layer (34, 36) is situated on the edge of the recess (37) outside of a main current path extending between the contact surface and the inner conductive structure (22).
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IPC分类: