发明公开
EP1666413A1 TANTALUM CARBIDE, METHOD FOR PRODUCING TANTALUM CARBIDE, TANTALUM CARBIDE WIRING AND TANTALUM CARBIDE ELECTRODE
有权
钽硬质合金，生产钽碳化物的方法，碳化钽导线和碳化钽电极
- 专利标题： TANTALUM CARBIDE, METHOD FOR PRODUCING TANTALUM CARBIDE, TANTALUM CARBIDE WIRING AND TANTALUM CARBIDE ELECTRODE
- 专利标题（中）： 钽硬质合金，生产钽碳化物的方法，碳化钽导线和碳化钽电极
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申请号： EP04771326.8申请日： 2004-07-30
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公开(公告)号： EP1666413A1公开(公告)日： 2006-06-07
- 发明人: KANEKO, Tadaaki , ASAOKA, Yasushi , SANO, Naokatsu
- 申请人： The New Industry Research Organization
- 申请人地址： 5-2, Minatojima-minamimachi 1-chome, Chuo-ku Kobe-shi, Hyogo 650-0047 JP
- 专利权人： The New Industry Research Organization
- 当前专利权人： The New Industry Research Organization
- 当前专利权人地址： 5-2, Minatojima-minamimachi 1-chome, Chuo-ku Kobe-shi, Hyogo 650-0047 JP
- 代理机构： Hart Davis, Jason
- 优先权： JP2003284708 20030801
- 国际公布： WO2005012174 20050210
- 主分类号： C01B31/30
- IPC分类号： C01B31/30 ; C23C8/02 ; C23C8/20
摘要：
It is an object of the present invention to provide a method for manufacturing tantalum carbide which can form tantalum carbide having a prescribed shape using a simple method, can form the tantalum carbide having a uniform thickness even when the tantalum carbide is coated on the surface of an article and is not peeled off by a thermal history, tantalum carbide obtained by the manufacturing method, wiring of tantalum carbide, and electrodes of tantalum carbide.
The tantalum carbide is formed on the surface of tantalum or a tantalum alloy by placing the tantalum or tantalum alloy in a vacuum heat treatment furnace, heat-treating the tantalum or tantalum alloy under a condition where a native oxide layer of Ta 2 O 5 formed on the surface of tantalum or tantalum alloy is sublimated to remove the Ta 2 O 5 , introducing a carbon source into the vacuum heat treatment furnace, and then heat-treating.
The tantalum carbide is formed on the surface of tantalum or a tantalum alloy by placing the tantalum or tantalum alloy in a vacuum heat treatment furnace, heat-treating the tantalum or tantalum alloy under a condition where a native oxide layer of Ta 2 O 5 formed on the surface of tantalum or tantalum alloy is sublimated to remove the Ta 2 O 5 , introducing a carbon source into the vacuum heat treatment furnace, and then heat-treating.
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