发明公开
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 光刻设备和器件制造方法
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申请号： EP05257581.8申请日： 2005-12-09
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公开(公告)号： EP1672432A1公开(公告)日： 2006-06-21
- 发明人: Jansen, Hans , Tinnemans, Patricius Aloysius Jacobus , Van der Toorn, Jan-Gerard Cornelis
- 申请人： ASML Netherlands B.V.
- 申请人地址： De Run 6501 5504 DR Veldhoven NL
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： De Run 6501 5504 DR Veldhoven NL
- 代理机构： Leeming, John Gerard
- 优先权： US12061 20041215
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.
公开/授权文献
- EP1672432B1 Lithographic apparatus and device manufacturing method 公开/授权日：2010-04-28
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