公开(公告)号：EP2284613B1

公开(公告)日：2012-04-04

申请号：EP10179595.3

申请日：2004-08-25

申请人： ASML Netherlands B.V.

发明人： Dierichs, Marcel ,  Donders, Sjoerd ,  Jacobs, Johannes ,  Jansen, Hans ,  Loopstra, Erik ,  Mertens, Jeroen ,  Stavenga, Marco ,  Streefkerk, Bob ,  Verhagen, Martinus ,  Seuntiens, Lejla

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

公开(公告)号：EP1693708B1

公开(公告)日：2008-01-02

申请号：EP06250757.9

申请日：2006-02-13

申请人： ASML Netherlands B.V.

发明人： Stavenga, Marco Koert ,  Jacobs, Johannes Henricus Wilhelmus ,  Jansen, Hans ,  Verhagen, Martinus Cornelis Maria

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/709

公开(公告)号：EP1693708A3

公开(公告)日：2006-11-02

申请号：EP06250757.9

申请日：2006-02-13

申请人： ASML Netherlands B.V.

发明人： Stavenga, Marco Koert ,  Jacobs, Johannes Henricus Wilhelmus ,  Jansen, Hans ,  Verhagen, Martinus Cornelis Maria

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/709

摘要： Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves (20), a bleed flow (22) around or through one or more valves, diversion of liquid to a drain (24) rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume / damper to compensate for pressure fluctuation.

公开(公告)号：EP1672432A1

公开(公告)日：2006-06-21

申请号：EP05257581.8

申请日：2005-12-09

申请人： ASML Netherlands B.V.

发明人： Jansen, Hans ,  Tinnemans, Patricius Aloysius Jacobus ,  Van der Toorn, Jan-Gerard Cornelis

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.

摘要翻译： 本发明涉及当封闭表面用于将液体限制在液体供给系统中时减少光刻设备中的浸没液体的污染的方法。 为了避免或减少由与液体供应系统碰撞的闭合表面引起的颗粒污染，闭合表面保持在距离液体供应系统一定距离处，使得闭合表面和液体供应系统之间没有碰撞，但是 液体仍然受到限制。

公开(公告)号：EP2056164A1

公开(公告)日：2009-05-06

申请号：EP08253577.4

申请日：2008-10-31

申请人： ASML Netherlands B.V.

发明人： De Jong, Anthonius M.C.P. ,  Jansen, Hans ,  Leenders, Martinus H.A. ,  Blom, Paul ,  Kramer, Ronald H.G. ,  Van Putten, Michel ,  De Graaf, Ariël

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 ,  G03F7/70341 ,  G03F7/70733

摘要： A cleaning apparatus (42) for cleaning a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus (42) comprise may comprise a plasma radical source (45), a conduit (48) and a radical confinement system (40). The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of said surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the apparatus for cleaning one or more surfaces is also disclosed. The immersion lithographic apparatus may comprise a substrate table for supporting a substrate and a fluid confinement structure for confining immersion fluid between a projection system and substrate table and/or substrate.
An immersion lithographic apparatus is disclosed.

摘要翻译： 公开了一种用于清洗浸没式光刻设备的基板或部件的清洁设备（42）。 清洁装置（42）可包括等离子体源（45），导管（48）和激光束限制系统（40）。 等离子体自由基源可以提供自由基流。 导管可以将来自等离子体源的源自由基提供到待清洁的表面。 自由基限制系统可以引导自由基清洁所述表面的局部化部分。 清洁装置可以包括旋转器并且可以被配置为清洁基板边缘。 还公开了包括用于清洁一个或多个表面的装置的浸没式光刻设备。 浸没式光刻设备可以包括用于支撑衬底的衬底台和用于将浸没流体限制在投影系统和衬底台和/或衬底之间的流体限制结构。 公开了一种浸没式光刻设备。

公开(公告)号：EP1510872A3

公开(公告)日：2005-05-25

申请号：EP04255118.4

申请日：2004-08-25

申请人： ASML Netherlands B.V.

发明人： Dierichs, Marcel Mathijs Theodore Marie ,  Donders, Sjoerd Nicolaas Lambertus ,  Jacobs, Johannes Henricus Wilhelmus ,  Jansen, Hans ,  Loopstra,Erik Roelof ,  Mertens, Jeroen Johannes Sophia Maria ,  Stavenga, Marco Koert ,  Streefkerk, Bob ,  Verhagen, Martinus Cornelis Maria ,  Seuntiens-Gruda, Lejla

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced.

摘要翻译： 在光刻投影设备中，液体供应系统利用液体限制系统将液体保持在投影系统的最终元件和衬底之间的空间中。 液体供应系统还包括去矿化单元，蒸馏单元和用于净化浸没液体的UV辐射源。 为了抑制生命形式生长，化学品可以被添加到浸没液体中，并且液体供应系统的组件可以由对可见光不透明的材料制成，使得生命形式的生长减少。

公开(公告)号：EP1059566A3

公开(公告)日：2002-09-18

申请号：EP00304667.9

申请日：2000-06-01

申请人： ASML Netherlands B.V.

发明人： Van Empel, Tjarko Adriaan Rudolf ,  Jansen, Hans

IPC分类号： G03F7/20

CPC分类号： G03F7/707

摘要： A lithographic projection apparatus comprising: a radiation system (LA,EX,IN,CO) for supplying a projection beam (PB) of radiation; a mask table (MT) provided with a mask holder for holding a mask (MA); a substrate table (WT) provided with a substrate holder for holding a substrate (W); a projection system (PL) for imaging an irradiated portion of the mask onto a target portion (C) of the substrate, the substrate holder having a supporting face (S:4,6,6',8) for supporting a substrate, the said supporting face being at least partially coated with a layer of electrically conductive material.

摘要翻译： 一种光刻投影设备，包括：用于提供辐射的投影光束（PB）的辐射系统（LA，EX，IN，CO） 具有用于保持掩模（MA）的掩模架的掩模台（MT）; 衬底台（WT），设置有用于保持衬底（W）的衬底保持器; 用于将掩模的照射部分成像到衬底的目标部分（C）上的投影系统（PL），所述衬底支架具有用于支撑衬底的支撑面（S：4,6,6'，8），所述 所述支撑面至少部分地涂覆有导电材料层。

公开(公告)号：EP1500986B1

公开(公告)日：2011-04-06

申请号：EP04254151.6

申请日：2004-07-12

申请人： ASML Netherlands B.V.

发明人： Sengers, Timotheus Franciscus ,  Donders, Sjoerd Nicolaas Lambertus ,  Jansen, Hans ,  Boogaard, Arjen

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

摘要： In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate of the lithographic projection apparatus. A sensor positioned on a substrate table which holds the substrate is adapted for being imaged when immersed in immersion liquid (i.e. under the same conditions as the substrate will be imaged). By ensuring that a primary outer surface of an absorption element of the sensor is formed of one or fewer metal types, long life of the sensor can be expected.

公开(公告)号：EP2284613A1

公开(公告)日：2011-02-16

申请号：EP10179595.3

申请日：2004-08-25

申请人： ASML Netherlands B.V.

发明人： Dierichs, Marcel ,  Donders, Sjoerd ,  Jacobs, Johannes ,  Jansen, Hans ,  Loopstra, Erik ,  Mertens, Jeroen ,  Stavenga, Marco ,  Streefkerk, Bob ,  Verhagen, Martinus ,  Seuntiens, Lejla

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate with a liquid confinement system. The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms is reduced.

摘要翻译： 在光刻投影装置中，液体供应系统使用液体限制系统将液体保持在投影系统的最终元件和基板之间的空间中。 液体供应系统还包括去矿化单元，蒸馏单元和用于净化浸液的UV辐射源。 可以将化学品添加到浸渍液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命形式的生长降低。

公开(公告)号：EP1837705A3

公开(公告)日：2007-12-19

申请号：EP07013766.6

申请日：2006-04-26

申请人： ASML Netherlands B.V.

发明人： Streefkerk, Bob ,  Donders, Sjoerd, Nicolaas, Lambertus ,  De Graaf, Roelof, Frederik ,  Hoogendam, Christiaan, Alexander ,  Jansen, Hans ,  Leenders, Martinus, Hendrikus, Antonius ,  Liebregts, Paulus, Martinus, Maria ,  Mertens, Jeroen, Johannes, Sophia, Maria ,  Van der Toorn, Jan-Gerard, Cornelis ,  Riepen, Michel

IPC分类号： G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a barrier member which defines a space for containing liquid between the projection system and the substrate. In order to minimize the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In some embodiments the shape of the final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有阻挡构件，该阻挡构件限定用于在投影系统和衬底之间容纳液体的空间。 为了最小化正在成像的衬底边缘的交叉（其可以导致在浸没液体中包含气泡），平行于衬底的平面中的空间的横截面面积被制成与 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一些实施例中，投影系统的最终元件的形状也被改变为在平行于衬底的横截面中具有与目标部分的横截面类似的尺寸和/或形状。