发明公开
EP1684420A3 Band filter using film bulk acoustic resonator and method of fabricating the same
审中-公开
与薄膜体声波谐振器和过程及其制备波段滤波器
- 专利标题: Band filter using film bulk acoustic resonator and method of fabricating the same
- 专利标题(中): 与薄膜体声波谐振器和过程及其制备波段滤波器
-
申请号: EP06001244.0申请日: 2006-01-20
-
公开(公告)号: EP1684420A3公开(公告)日: 2007-10-10
- 发明人: Hong, Seog-woo , Ha, Byeoung-ju , Song, In-sang , Kim, Kyu-sik
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: 416 Maetan-Dong Yeongtong-Gu Suwon-si, Gyeonggi-Do KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: 416 Maetan-Dong Yeongtong-Gu Suwon-si, Gyeonggi-Do KR
- 代理机构: Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
- 优先权: KR2005006771 20050125
- 主分类号: H03H3/02
- IPC分类号: H03H3/02 ; H03H9/02 ; H03H9/58 ; B81C1/00
摘要:
A band filter using a film bulk acoustic resonator and a method of fabricating the same. The method includes the steps of forming a membrane layer on a substrate, forming a plurality of resonators on an upper surface of the membrane layer, depositing a mask layer on a lower surface of the membrane layer and patterning the mask layer to form a plurality of main windows and sub windows, and forming cavities along the main windows in the substrate and forming sub walls in the cavities in such a way that the sub walls are separated apart from the membrane layer by using the notch effect caused during a dry etching. It is possible to precisely form cavities with desired sizes even if the cavities have different sizes, to reduce the notched areas in the cavities, to reduce the total size of the filter by decreasing a distance between the cavities and to reduce the total length of wires.
公开/授权文献
信息查询