发明公开
- 专利标题： PLASMA SOURCE WITH SEGMENTED MAGNETRON CATHODE
- 专利标题（中）： 具有分段磁控阴极等离子体源
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申请号： EP04810268.5申请日： 2004-11-04
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公开(公告)号： EP1690279A2公开(公告)日： 2006-08-16
- 发明人: CHISTYAKOV, Roman
- 申请人： Zond, Inc.
- 申请人地址： 137A High Street Mansfield, MA 02048 US
- 专利权人： Zond, Inc.
- 当前专利权人： Zond, Inc.
- 当前专利权人地址： 137A High Street Mansfield, MA 02048 US
- 代理机构： Jackson, Robert Patrick
- 优先权： US481671P 20031119; US710946 20040813
- 国际公布： WO2005052979 20050609
- 主分类号： H01J37/34
- IPC分类号： H01J37/34
摘要：
A plasma source includes a chamber for containing a feed gas. An anode is positioned in the chamber. A segmented magnetron cathode comprising a plurality of electrically isolated magnetron cathode segments is positioned in the chamber proximate to the anode. A power supply is electrically connected to an electrical input of a switch. A respective one of the plurality of electrical outputs of the switch is electrically connected to a respective one of the plurality of magnetron cathode segments. The power supply generates a train of voltage pulses that ignites a plasma from the feed gas. Individual voltage pulses in the train of voltage pulses are routed by the switch in a predetermined sequence to at least two of the plurality of magnetron cathode segments.
公开/授权文献
- EP1690279B1 PLASMA SOURCE WITH SEGMENTED MAGNETRON CATHODE 公开/授权日：2012-03-21
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