发明公开
- 专利标题: NEUTRAL PARTICLE BEAM PROCESSING APPARATUS
- 专利标题(中): 设备要处理的中性粒子束
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申请号: EP04808243申请日: 2004-11-27
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公开(公告)号: EP1695599A4公开(公告)日: 2006-11-22
- 发明人: LEE HAG-JOO , LEE BONG-JU , YOO SUK-JAE
- 申请人: SEM TECHNOLOGY CO LTD , KOREA BASIC SCIENCE INST
- 专利权人: SEM TECHNOLOGY CO LTD,KOREA BASIC SCIENCE INST
- 当前专利权人: SEM TECHNOLOGY CO LTD,KOREA BASIC SCIENCE INST
- 优先权: KR20030084946 2003-11-27
- 主分类号: H01J37/32
- IPC分类号: H01J37/32 ; H05H3/06 ; H05H3/02
摘要:
The present invention relates to a neutral particle beam processing apparatus. More specifically, the present invention relates to a neutral particle beam processing apparatus comprising a plasma discharging space inside which processing gases are converted to plasma ions through a plasma discharge, a heavy metal plate which converts the plasma ions into neutral particles through collisions, a plasma limiter which prevents plasma ions and electrons from passing through and allows the neutral particles produced by collisions of the plasma ions with the heavy metal plate to pass through, and a treating housing inside which a substrate to be treated is located, wherein the plasma discharging space is sandwiched between the heavy metal plate and the plasma limiter.
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