发明公开
EP1697962A1 METHOD OF AND ARRANGEMENT FOR REMOVING CONTAMINANTS FROM A SUBSTRATE SURFACE USING AN ATMOSPHERIC PRESSURE GLOW PLASMA
有权
方法和系统去除污染物从基板表面使用大气压GLÜHPLASMAS
- 专利标题： METHOD OF AND ARRANGEMENT FOR REMOVING CONTAMINANTS FROM A SUBSTRATE SURFACE USING AN ATMOSPHERIC PRESSURE GLOW PLASMA
- 专利标题（中）： 方法和系统去除污染物从基板表面使用大气压GLÜHPLASMAS
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申请号： EP04808813.2申请日： 2004-12-22
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公开(公告)号： EP1697962A1公开(公告)日： 2006-09-06
- 发明人: DE VRIES, Hindrik, Willem , ALDEA, Eugen , BOUWSTRA, Jan, Bastiaan , VAN DE SANDEN, Mauritius, Cornelius, Maria
- 申请人： Fuji Photo Film B.V
- 申请人地址： Oudenstaart 1 5000 LJ Tilburg NL
- 专利权人： Fuji Photo Film B.V
- 当前专利权人： Fuji Photo Film B.V
- 当前专利权人地址： Oudenstaart 1 5000 LJ Tilburg NL
- 代理机构： Dohmen, Johannes Maria Gerardus
- 优先权： EP03079009 20031222; EP04077286 20040813
- 国际公布： WO2005062338 20050707
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; H05H1/24
摘要：
The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling caid displacement current during plasma generation such that modification of properties of said substrate surface is prevented.
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