发明公开
- 专利标题: CATADIOPTRIC PROJECTION OBJECTIVE
- 专利标题(中): 影响投影的目标
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申请号: EP05700877.3申请日: 2005-01-13
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公开(公告)号: EP1709472A2公开(公告)日: 2006-10-11
- 发明人: SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander
- 申请人: Carl Zeiss SMT AG
- 申请人地址: Carl-Zeiss-Strasse 22 73447 Oberkochen DE
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: Carl-Zeiss-Strasse 22 73447 Oberkochen DE
- 代理机构: Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner
- 优先权: US536248P 20040114; US587504P 20040714; US591775P 20040727; US612823P 20040924; US617674P 20041013
- 国际公布: WO2005069055 20050728
- 主分类号: G02B17/00
- IPC分类号: G02B17/00
摘要:
A catadioptric projection objective (200) for imaging a pattern provided in an object plane (201) of the projection objective onto an image plane (202) of the projection objective comprises: a first objective part (210) for imaging the pattern provided in the object plane into a first intermediate image; a second objective part (220) for imaging the first intermediate imaging into a second intermediate image; a third objective part (230) for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror (221) having a first continuous mirror surface and at least one second concave mirror (222) having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
公开/授权文献
- EP1709472B1 CATADIOPTRIC PROJECTION OBJECTIVE 公开/授权日:2008-08-06
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |