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公开(公告)号：EP2203785A1
公开(公告)日：2010-07-07
申请号：EP08841328.1
申请日：2008-10-11
申请人： Carl Zeiss SMT AG
IPC分类号： G03F7/20
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system (7) has a plurality of mirrors (M1 to M6). These image an object field (4) in an object plane (5) into an image field (8) in an image plane (9). In the imaging optical system (7), the ratio of a maximum angle of incidence of imaging light (15) on reflection surfaces of the mirrors (M1 to M6) and an image-side numerical aperture of the imaging optical system (7) is less than 33.8°. This results in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
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公开(公告)号：EP1771771B1
公开(公告)日：2009-12-30
申请号：EP05785351.7
申请日：2005-07-08
申请人： Carl Zeiss SMT AG
发明人： SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander , BEDER, Susanne , SINGER, Wolfgang
CPC分类号： G02B17/0892 , G02B17/0828 , G03F7/70225 , G03F7/70275 , G03F7/70341
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公开(公告)号：EP2021854A2
公开(公告)日：2009-02-11
申请号：EP07783270.7
申请日：2007-05-04
申请人： Carl Zeiss SMT AG
发明人： SHAFER, David , DODOC, Aurelian , FELDMANN,, Heiko , ZELLNER, Johannes , ULRICH, Wilhelm , WALTER, Holger , LOERING, Ulrich , KRAEHMER, Daniel , FUERTER, Gerhard
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
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公开(公告)号：EP1839092A2
公开(公告)日：2007-10-03
申请号：EP05823929.4
申请日：2005-12-30
申请人： Carl Zeiss SMT AG
发明人： ULRICH, Wilhelm , DODOC, Aurelian
CPC分类号： G03F7/70225 , G02B13/143 , G03F7/70241
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses, such that a total refractive power of each group of lenses is one of a negative refractive power and a positive refractive power; and wherein a refractive power of each lens of the fourth group of lenses is equal to or greater than 0. A lens of the third group of lenses which is disposed directly adjacent to a lens of the fourth group of lenses may have a concave surface facing towards the second object.
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公开(公告)号：EP1782128A2
公开(公告)日：2007-05-09
申请号：EP05778929.9
申请日：2005-08-23
申请人： Carl Zeiss SMT AG
IPC分类号： G03F7/20
CPC分类号： G03F7/70108 , G03F7/70183
摘要： An illumination system of a microlithographic exposure apparatus (PEA) has an optical axis (OA) and a beam transforming device (20; 120; 220; 320; 420; 520; 1020; 1120; 1220; 1320; 1420; 1520). This device comprises a first mirror (122; 222; 322; 422; 522; 1122; 1222; 1322; 1422; 1522) with a first reflective surface (124; 224; 424; 524; 1124; 1224) having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis (OA), around the optical axis (OA). The device further comprises a second mirror (126, 126a, 126b; 226a, 226b; 326a, 326b; 426a; 426b; 526; 1126; 1226; 1326a, 1326b; 1426a, 1426b; 1526a, 1526b) with a second reflective surface (130, 130a, 130b; 1130) having a shape that is defined by rotating a curved line around the optical axis (OA). At least one of the mirrors has a central aperture (128) containing the optical axis (OA). This device may form a zoom-collimator (1020; 1120; 1220; 1320; 1420; 1520) for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.
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公开(公告)号：EP1456705A2
公开(公告)日：2004-09-15
申请号：EP02747468.3
申请日：2002-07-19
申请人： Carl Zeiss SMT AG
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptrical projection lens, which produces an image in an image plane of a model, arranged in an object plane, by generation of a real intermediate image, has a catadioptrical first objective piece, a concave mirror and a beam diverter device between the object plane and the image plane and, beyond the beam diverter device, a dioptrical second objective piece. The beam diverter device has a preferably fully-reflective first mirror surface, for diverting the radiation arriving from the object plane onto the concave mirror. In an optically close region to the object plane, in which the height of the main beam of the radiation emanating from the object is greater than the height of the boundary beam, a positive refractive element is arranged behind the first mirror surface, between the above and the concave mirror. An object-side, telecentric projection lens may thus be produced with relatively small lens dimensions and easily corrected with moderate requirements for the coating of the mirror surfaces.
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公开(公告)号：EP1690139B1
公开(公告)日：2009-01-14
申请号：EP04819629.9
申请日：2004-11-25
申请人： Carl Zeiss SMT AG
CPC分类号： G03F7/70241 , G02B13/143
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation (1) is fulfilled: (1) wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, φi is a refractive power in mm-1 of the ith lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.
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公开(公告)号：EP1709472B1
公开(公告)日：2008-08-06
申请号：EP05700877.3
申请日：2005-01-13
申请人： Carl Zeiss SMT AG
发明人： SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective (200) for imaging a pattern provided in an object plane (201) of the projection objective onto an image plane (202) of the projection objective comprises: a first objective part (210) for imaging the pattern provided in the object plane into a first intermediate image; a second objective part (220) for imaging the first intermediate imaging into a second intermediate image; a third objective part (230) for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror (221) having a first continuous mirror surface and at least one second concave mirror (222) having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
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公开(公告)号：EP1751601B1
公开(公告)日：2007-12-05
申请号：EP05738376.2
申请日：2005-05-13
申请人： Carl Zeiss SMT AG
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
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10.发明公开
公开(公告)号：EP1730596A2
公开(公告)日：2006-12-13
申请号：EP05716194.5
申请日：2005-03-18
申请人： Carl Zeiss SMT AG
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|
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