发明公开
EP1715086A1 Method for reducing defect concentrations in crystals
有权
克里斯塔伦(Ver。)的维克多伦(Verminderung von Defektkonzentrationen)
- 专利标题: Method for reducing defect concentrations in crystals
- 专利标题(中): 克里斯塔伦(Ver。)的维克多伦(Verminderung von Defektkonzentrationen)
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申请号: EP06013705.6申请日: 2003-06-25
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公开(公告)号: EP1715086A1公开(公告)日: 2006-10-25
- 发明人: D'Evelyn, Mark Philip , Arthur, Stephen Daley , Rowland, Larry Burton , Vagaralli, Suresh Shankarappa , Lucek, John William , Anthony, Thomas Richard , Levinson, Lionel Monty
- 申请人: GENERAL ELECTRIC COMPANY
- 申请人地址: 1 River Road Schenectady, NY 12345 US
- 专利权人: GENERAL ELECTRIC COMPANY
- 当前专利权人: GENERAL ELECTRIC COMPANY
- 当前专利权人地址: 1 River Road Schenectady, NY 12345 US
- 代理机构: Szary, Anne Catherine
- 优先权: US392741P 20020627
- 主分类号: C30B33/00
- IPC分类号: C30B33/00
摘要:
A method for removing defects at high pressure and high temperature (HP/HT) or for relieving strain in a non-diamond crystal commences by providing a crystal, which contains defects, and a pressure medium. The crystal and the pressure medium are disposed in a high pressure cell and placed in a high pressure apparatus, for processing under reaction conditions of sufficiently high pressure and high temperature for a time adequate for one or more of removing defects or relieving strain in the single crystal.
公开/授权文献
- EP1715086B1 Method for reducing defect concentrations in crystals 公开/授权日:2012-03-14
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