发明公开
EP1727924A1 DEPOT PAR PULVERISATION CATHODIQUE MAGNETRON EN REGIME IMPULSIONNEL AVEC PREIONISATION
审中-公开
分离通过阴极MAGNETRONPULVERISIERUNG均与预电离脉冲模式
- 专利标题： DEPOT PAR PULVERISATION CATHODIQUE MAGNETRON EN REGIME IMPULSIONNEL AVEC PREIONISATION
- 专利标题（英）： Deposition by magnetron cathodic pulverization in a pulsed mode with preionization
- 专利标题（中）： 分离通过阴极MAGNETRONPULVERISIERUNG均与预电离脉冲模式
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申请号： EP05728585.0申请日： 2005-03-22
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公开(公告)号： EP1727924A1公开(公告)日： 2006-12-06
- 发明人: GANCIU-PETCU, Mihai , HECQ, Michel , DAUCHOT, Jean-Pierre , KONSTANTINIDIS, Stephanos , BRETAGNE, Jean , DE POUCQUES, Ludovic , TOUZEAU, Michel
- 申请人： Materia Nova A.S.B.L , Centre National de la Recherche Scientifique , Universite Paris-Sud
- 申请人地址： Parc Initialis, Avenue Copernic, 1 7000 Mons BE
- 专利权人： Materia Nova A.S.B.L,Centre National de la Recherche Scientifique,Universite Paris-Sud
- 当前专利权人： Materia Nova A.S.B.L,Centre National de la Recherche Scientifique,Universite Paris-Sud
- 当前专利权人地址： Parc Initialis, Avenue Copernic, 1 7000 Mons BE
- 代理机构： Van Malderen, Joëlle
- 优先权： EP04447072 20040322
- 国际公布： WO2005090632 20050929
- 主分类号： C23C14/35
- IPC分类号： C23C14/35 ; H01J37/34
摘要：
The invention relates to the deposition, in a magnetron reactor (1) fitted with a magnetron cathode (CM), of at least one material on a substrate (11a), said material being vaporized, by means of magnetron cathodic pulverization, with the aid of a gas which is ionized in a pulsed mode. In order to promote the formation of high current pulses of a short duration, while avoiding the formation of arcs and enabling efficient ionization of the pulverized vapor, the gas is preonized prior to application of the main voltage pulse to the magnetron cathode (CM) such that it is possible to generate current pulses (IC) whose duration of decline (Td) is less than 5µs after interruption of the main voltage pulse (IT).
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