专利检索 ap:("Materia Nova A.S.B.L" OR "Centre National de la Recherche Scientifique" OR "Universite Paris-Sud") AND inv:"HECQ, Michel" 第 1 页

1.

发明公开
DEPOT PAR PULVERISATION CATHODIQUE MAGNETRON EN REGIME IMPULSIONNEL AVEC PREIONISATION 审中-公开
标题翻译：分离通过阴极MAGNETRONPULVERISIERUNG均与预电离脉冲模式

公开(公告)号：EP1727924A1

公开(公告)日：2006-12-06

申请号：EP05728585.0

申请日：2005-03-22

申请人： Materia Nova A.S.B.L , Centre National de la Recherche Scientifique , Universite Paris-Sud

发明人： GANCIU-PETCU, Mihai , HECQ, Michel , DAUCHOT, Jean-Pierre , KONSTANTINIDIS, Stephanos , BRETAGNE, Jean , DE POUCQUES, Ludovic , TOUZEAU, Michel

IPC分类号： C23C14/35 , H01J37/34

CPC分类号： C23C14/35 , C23C14/358 , H01J37/3405 , H01J37/3444

摘要： The invention relates to the deposition, in a magnetron reactor (1) fitted with a magnetron cathode (CM), of at least one material on a substrate (11a), said material being vaporized, by means of magnetron cathodic pulverization, with the aid of a gas which is ionized in a pulsed mode. In order to promote the formation of high current pulses of a short duration, while avoiding the formation of arcs and enabling efficient ionization of the pulverized vapor, the gas is preonized prior to application of the main voltage pulse to the magnetron cathode (CM) such that it is possible to generate current pulses (IC) whose duration of decline (Td) is less than 5µs after interruption of the main voltage pulse (IT).