发明授权
EP1743055B1 METHOD AND APPARATUS FOR THE GROWTH OF SEMICONDUCTOR, PARTICULARLY SILICON, RIBBONS
有权
方法和装置用于牵引半导体,特别是硅,磁带
- 专利标题: METHOD AND APPARATUS FOR THE GROWTH OF SEMICONDUCTOR, PARTICULARLY SILICON, RIBBONS
- 专利标题(中): 方法和装置用于牵引半导体,特别是硅,磁带
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申请号: EP04727772.8申请日: 2004-04-15
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公开(公告)号: EP1743055B1公开(公告)日: 2010-12-29
- 发明人: VALLÊRA, António , SERRA, João , MAIA ALVES, Jorge , BRITO, Miguel , GAMBOA, Roberto , HENRIQUES, João
- 申请人: Faculdade de Ciencias da Universidade de Lisboa
- 申请人地址: Campo Grande 1749-016 Lisboa PT
- 专利权人: Faculdade de Ciencias da Universidade de Lisboa
- 当前专利权人: Faculdade de Ciencias da Universidade de Lisboa
- 当前专利权人地址: Campo Grande 1749-016 Lisboa PT
- 代理机构: Pereira da Cruz, Jorge Afonso
- 国际公布: WO2005100644 20051027
- 主分类号: C30B15/00
- IPC分类号: C30B15/00 ; C30B13/00 ; C30B29/06
摘要:
The present invention provides a method for the continuous production of semiconductor ribbons by growth from a linear molten zone. The creation of the molten zone is achieved by application of an electric current, direct or alternating, parallel to the surface of the ribbon and perpendicular to the direction of growth, and intense enough to melt the said material, preferably using electrodes of the said material. The molten zone is fed by transference of the material, in the liquid state, from one or more reservoirs, where melting of the feedstock occurs. Preferably, the said electrodes and the said reservoir(s) are only constituted by the said material, thus avoiding contamination by foreign materials. The present invention is applicable, for example, in the industry of silicon ribbons production for photovoltaic application.
公开/授权文献
- EP1743055A1 METHOD FOR THE GROWTH OF SEMICONDUCTOR RIBBONS 公开/授权日:2007-01-17
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